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Oxidation and structure scheme studies for sensitivity improvement of Si1xGex nanowire biosensor

Chu-Feng Chen,Kow-Ming Chang,Yu-Bin Wang,Chung-Hsien Liu,Chin-Ning Wu,Cheng-Ting Hsieh,賴瓊惠,Kuo-Chin Chang

Electronics Engineering Engineering

[email protected] Abstract

　　Because of the large surface-to-volume ratio of nano-structure, the silicon nanowires (SiNWs) provide a

high sensitivity for highly sensitive detection of biological and chemical species. Moreover, the SiGe-on-Insulator

(SGOI) by Ge-condensation process can enhance the

mobility of hole carrier and then improve the nanowires’s conductance. In this study, we discuss SiGe nanowire

structural effect by changing Si/SiGe stacked ratio and oxidation effect in different annealing ambient. The

optimized Si/SiGe stacked structure with suitable oxidation process has more twice enhancement of sensitivity compared to conventional SiNWs biosensor.

Keyword：SiGe, Ge-condendation, Nanowire, Bisosensor

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