To show that the catalyst is necessary for the resist to function, the standard resist prep was used except the polymer was precipitated into methanol to extract the quenched catalyst. Catalyst 3 (1.3 mg) was placed under argon and dissolved in 2 mL dichloromethane. To this catalyst solution was quickly added 1.5 mL 1,5- cyclooctadiene, the solution became a semi-solid in 10 seconds and was allowed to react for 1 minute before quenching with 3 mL ethyl vinyl ether. The viscous solution was very slowly stirred for 5 minutes, after which 5 mL methanol was added. The suspension was sonicated for 20 minutes, the brown solution was decanted, and the off- white solid polymer was washed three times with 10 mL of methanol. The polymer was dried in vacuo, and dissolved in 10 mL 5-ethylidene-2-norbornene to afford a very pale yellow, viscous solution. This solution was cast as before and exposed for 6 minutes at 254 nm (4 times the standard exposure for the analogous resist) with no evidence of pattern formation. After developing with hexanes, a clean Si surface was recovered. As well, prolonged irradiation of pure ENBE at both 254 nm and 352 nm did not render any change in viscosity or other evidence of crosslinking. The addition of BHT (2,6-Di-tert-butyl-4-methylphenol) to the PLOMP resist did not appear to change its behavior, which suggests that the mechanism does not involve radicals.
To support the hypothesis that the ruthenium vinyl ether complex is intact inside the PLOMP resist, the 1H NMR spectra of a PLOMP resist and complex 5 were compared. The resist was prepared by the standard recipe above. Complex 5 was prepared as reported by Louie. The spectra strongly support the proposed compo- sition of the PLOMP photoresist; the alkylidene protons in each spectrum are less than 1 ppm apart (Figure 5.5).
1H NMR spectra in CD2Cl2 of complex 5 and a PLOMP photoresist. The region of the alkylidene proton is shown to highlight the similarity between the two. No other peaks were observed in the downfield region (δ = 11 - 22 ppm), suggesting that no other ruthenium alkylidene species are present in any significant quantity.
To support the hypothesis that dative bonding from the highly olefinic resist sta-
Figure 5.5: The carbene regions of the 1H NMR spectra are compared. The shift of the PLOMP resist is within 1 ppm of the Ru vinyl ether complex reported by Louie.
[14]
bilizes the photoactive complex, two experiments were performed. First, the formally 14-electron ruthenium vinyl ether species can be prepared by quenching the 2nd gen- eration Grubbs-Hoveyda catalyst with ethyl vinyl ether. This complex immediately crosslinks ENBE, suggesting that there is a ligand present in the resist that stabi- lizes the photoactive catalyst. Obvious candidates for this ligand include the original pyridine ligands from complex 3 or the olefins in the viscous resist material. Wenzel and coworkers have demonstrated the ability to remove pyridine ligands using acids such as trifluoroacetic acid (TFA).[15] If only the removal of a pyridine ligand was required to reactivate the complex, we would expect that crosslinking could also be triggered by acid. However, the addition of TFA lead to no change in viscosity after 24 hours. In fact, the PLOMP resist was still able to function in the presence of TFA; no change in behavior was observed for 254 nm photopatterning, 30 minutes after adding TFA. While these experiments do not explicitly rule out the presence of
a pyridine-coordinated complex, they strongly suggest that dative bonding from the surrounding olefins is the more likely mechanism of catalyst stabilization. This olefin could belong to the poly(COD), ENBE, or excess ethyl vinyl ether.
References
(1) Johnson, J. A.; Lu, Y. Y.; Burts, A. O.; Xia, Y.; Durrell, A. C.; Tirrell, D. A.;
Grubbs, R. H. Macromolecules 2010, 43, 10326–10335.
(2) Sailor, M. J.; Klavetter, F. L.; Grubbs, R. H.; Lewis, N. S. Nature 1990, 346, 155–157.
(3) Sveinbj¨ornsson, B. R.; Weitekamp, R. A.; Miyake, G. M.; Xia, Y.; Atwater, H. A.; Grubbs, R. H. Proceedings of the National Academy of Sciences 2012, 109, 14332–14336.
(4) Miyake, G. M.; Piunova, V. A.; Weitekamp, R. A.; Grubbs, R. H.Angewandte Chemie International Edition 2012, 51, 11246–11248.
(5) Monsaert, S.; Vila, A. L.; Drozdzak, R.; Van Der Voort, P.; Verpoort, F.Chem- ical Society Reviews 2009, 38, 3360–3372.
(6) Vidavsky, Y.; Lemcoff, N. G. Beilstein journal of organic chemistry 2010, 6, 1106–1119.
(7) Schaaf, P. A. van der; Hafner, A.; Muhlebach, A. Angewandte Chemie Inter- national Edition in English 1996, 35, 1845–1847.
(8) Wang, D.; Wurst, K.; Knolle, W.; Decker, U.; Prager, L.; Naumov, S.; Buch- meiser, M. R.Angewandte Chemie International Edition 2008,47, 3267–3270.
(9) Keitz, B. K.; Grubbs, R. H. Journal of the American Chemical Society 2009, 131, 2038–2039.
(10) Khalimon, A. Y.; Leitao, E. M.; Piers, W. E.Organometallics 2012,31, 5634–
5637.
(11) Subbotina, I. R.; Shelimov, B. N.; Kazansky, V. B.Kinetics and catalysis 1997, 38, 678–684.
(12) Maynard, H. D.; Okada, S. Y.; Grubbs, R. H.Macromolecules 2000,33, 6239–
6248.
(13) Sanford, M. S.; Love, J. A.; Grubbs, R. H. Journal of the American Chemical Society 2001, 123, 6543–6554.
(14) Louie, J.; Grubbs, R. H.Organometallics 2002,21, 2153–2164.
(15) Wenzel, A. G.; Blake, G.; VanderVelde, D. G.; Grubbs, R. H. Journal of the American Chemical Society 2011,133, 6429–6439.
Chapter 6
Functional Lithography via
PLOMP
Chapter Abstract
The previous chapter described the discovery of photoactuated reactivity of other- wise latent ruthenium complexes. In this chapter, we summarize our efforts to trans- form this discovery into a platform for patterning functional materials. We present three strategies for functional group incorporation, as well as a preliminary substrate scope for PLOMP. The poor stability of our pre-catalysts towards oxygen and heat was improved through the addition of stabilizing ligands. A substrate scope study demonstrates compatibility of PLOMP with a variety of functional additives. Ongo- ing efforts towards a number of specific applications of PLOMP are presented, such as robust chemical etch masks, peptide-functional surfaces towards biologically active scaffolds, new nanoimprintable materials, and electrocatalytic thin-films.