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Copyright by DH Lee Dept. of SCEE

Kukdong University

2018 Fall IC Fabrication & Processing

1

Appendix to Copper Plating – Schematics of Ideal Bottom-up Fill of Copper Seed Layer Deposition (1)

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Copyright by DH Lee Dept. of SCEE

Kukdong University

2018 Fall IC Fabrication & Processing

2

Appendix – Schematics of Ideal Bottom-up Fill of Copper Seed Layer Deposition (2)

(3)

Copyright by DH Lee Dept. of SCEE

Kukdong University

2018 Fall IC Fabrication & Processing

3

Appendix – Schematics of Ideal Bottom-up Fill of Copper Seed Layer Deposition (3)

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Copyright by DH Lee Dept. of SCEE

Kukdong University

2018 Fall IC Fabrication & Processing

4

Appendix – Schematics of Ideal Bottom-up Fill of Copper Seed Layer Deposition (4)

(5)

Copyright by DH Lee Dept. of SCEE

Kukdong University

2018 Fall IC Fabrication & Processing

5

Appendix – Schematics of Ideal Bottom-up Fill of Copper Seed Layer Deposition (5)

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Copyright by DH Lee Dept. of SCEE

Kukdong University

2018 Fall IC Fabrication & Processing

6

Appendix – Schematics of Ideal Bottom-up Fill of Copper Seed Layer Deposition (6)

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