445.664 445.664
Light
Light- -Emitting Diodes Emitting Diodes
Chapter 2.
Chapter 2.
Radiative and Non
Radiative and Non- -radiative Recombination radiative Recombination
Euijoon Yoon Euijoon Yoon
2 0 0 law
action
Mass n p = ni
p p
p n
n
n =
0+ Δ and =
0+ Δ
•Under equilibrium conditions,
n0 equilibrium electron concentration p0 equilibrium hole concentration ni intrinsic carrier concentration
• Under excitation conditions,
(absorption of light, injection of current)
n free electron concentration
Δn excess free electron concentration p free hole concentration
Δp
Electron and Hole Concentrations
Electron and Hole Concentrations
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Recombination of Carriers Recombination of Carriers
dt Bnp dp dt
R dn
equation rate
r
Bimolecula = − = − =
R recombination rate
( 10-11~ 10-9 cm3/s for III-V semiconductors) B bimolecular recombination coefficient
• The number of recombination events will be proportional to the concentration of electrons and holes
Radiative Recombination for Low
Radiative Recombination for Low- -level Excitation level Excitation
• Electrons and holes are generated and annihilated in pairs.
• For the case of low-level excitation, the photogenerated carrier concentration is much smaller than the majority carrier
concentration.
state - steady under
) ( ) (
Δ
nt =Δ
pt⇒
[ ][ ] ( )
excess
i
R R
t n p n B Bn t
p p t n n B R
) (
) ( )
(
0
0 0 2
0 0
+
=
+ +
= +
+
=
Δ Δ Δ
0
0
p p
n
n and << <<
⇒ Δ Δ
R0 equilibrium recombination rate Rexcess excess recombination rate
)
( )
( ) (
0
0
G
excessR R
excessG R dt G
t
dn = − = + − +
G0 equilibrium generation rate Gexcess excess generation rate
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Carrier Concentration as a Function of Time Carrier Concentration as a Function of Time
( )
n(t) R B(
n p)
n(t)dt n(t) d dt n
n(t) d dt
d
excess
= − + Δ
−
= Δ
= Δ +
=
⇒
0 0 0• t = 0(light off) Î Gexcess = 0
• Equilibrium Î G0 = R0
( )
Δ
τΔ
Δ n(t) = n
0e
−B n0+ p0 t= n
0e
−t( )
[
0 0]
1lifetime
carrier
τ
= B n + p −tors semiconduc type
- n for 1
1
tors semiconduc type
- p for 1
1
0 A
B N B n
B N B p
=
=
=
= τ τ
Carrier Lifetime
Carrier Lifetime
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Minority carriers
• Termination of photoexcitation
ÎThe carrier concentration decays exponentially with a characteristic time constant. (minority carrier lifetime, τ) Majority carriers
• The carrier concentration also decays with the same time constant.
• However, only a very small fraction of the majority carriers disappear by recombination.
Carrier lifetime can be extracted from minority carrier concentrations.
p-type semiconductors Î electron carrier lifetime n-type semiconductors Î hole carrier lifetime
Minority Carrier Lifetime Minority Carrier Lifetime
Minority Carrier Lifetime of p
Minority Carrier Lifetime of p- -type GaAs type GaAs
• In nominally undoped materials, minority carrier lifetime as long as 15 µs have been measured in GaAs at room temperature.
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Radiative Recombination for High
Radiative Recombination for High- -level Excitation level Excitation
• Electrons and holes are generated and annihilated in pairs.
• For the case of high-level excitation, the photogenerated carrier concentration is larger than the equilibrium carrier
concentration.
state - steady under ) ( ) (
Δn t = Δp t
⇒
) (
n >> n
0+ p
0⇒ Δ
[
0 ( )][
0 ( )]
2 ( )2
B n nt p pt Bn B nt
R = +
Δ
+Δ
= i +Δ
(
0)
1 0
0
1 )
( n( ) n
n t t B
n
Δ Δ
Δ Δ
== + −
2
n(t) B n(t)
dt
d Δ = − Δ
⇒
Înon-exponential carrier decay
Carrier Lifetime for High
Carrier Lifetime for High- -level Excitation level Excitation
) ) (
(
) ( 1 )
( 1
0 ) ( 0
dt n(t) d
t t n
n(t) t e t
dt n n(t) d
e n n(t)
t t t
Δ Δ τ
Δ τ Δ τ
Δ
Δ Δ
τ τ
−
=
⎟⎟ ⎠
⎜⎜ ⎞
⎝
⎛ −
⎟⎟ =
⎠
⎜⎜ ⎞
⎝
⎛ −
=
=
−
−
Low-level excitation
High-level excitation
(
0)
1)
( = − = t + B n
−dt n(t) d
t Δ Δ n(t) Δ
τ
time-dependentcarrier lifetime : definition of carrier lifetime
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Luminescence Decay Luminescence Decay
• The carrier decay in semiconductors can be measured by the decay of the luminescence after a short optical excitation pulse.
• luminescence intensity ∝ recombination rate ( R )
• All non-exponential decay functions can be expressed by an exponential function with a time-dependent time constant.
τ
τ Δ
0 /) (
n e
tdt t
R = − dn =
−(
0 1)
2) (
= − = − +
−n Bt
B dt
t R dn
Δ
for low excitation
for high excitation
1 0) ( 0 ) ( /
0
)
(
+ −−
=
−=
t B nt t
t
n e
e n t
n Δ
τΔ
ΔΔ
Îstretched exponential function
Radiative Recombination for High
Radiative Recombination for High- -level Excitation level Excitation
•For sufficient long times, low-level excitation conditions will be reached and τwill approach the low-level value.
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Non- Non -radiative Recombination in the Bulk radiative Recombination in the Bulk
Two basic recombination mechanisms in semiconductors Radiative recombination
: One photonwith energy equal to the bandgap energy is emitted.
Non-radiative recombination
: The electron energy is converted to vibrational energy of lattice atoms (phonon). Î Heat generation
Cause for Non
Cause for Non- -radiative Recombination Events radiative Recombination Events
• The most common cause for non-radiative recombination events : Defects in the crystal structure
foreign atoms – interstitial, substitutional
native defects – vacancies, antisite defects, interstitials dislocations
complexes of defects
• All such defects have energy level structures that are different from substitutional semiconductor atoms.
ÎOne or several energy levels within the forbidden gap of the semiconductor
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Electron and Hole Concentrations Electron and Hole Concentrations
(a) Recombination via deep levels (b)Auger recombination
(c) Radiative recombination
⎟⎠
⎜ ⎞
⎝
⎛ −
⎟ =
⎠
⎜ ⎞
⎝
⎛ −
= kT
E N E
kT p E N E
n0 cexp F c 0 vexp v F
Electron and Hole Concentrations Electron and Hole Concentrations
EF energy of Fermi level
Ec energy of lowest conduction band level Ev energy of highest valence band level
Nc effective density of levels for conduction band Nv effective density of levels for valence band
ni density of electrons in an intrinsic semiconductor n0 density of electrons at equilibrium condition p0 density of holes at equilibrium condition
2 0
0 c v exp v c ni
kT E N E
N p
n ⎟=
⎠
⎜ ⎞
⎝
⎛ −
=
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⎟⎠
⎜ ⎞
⎝
⎛ −
⎟ =
⎠
⎜ ⎞
⎝
⎛ −
= kT
E N E
kT p E N E
n1 cexp T c 1 vexp v T
Electron and Hole Concentrations (
Electron and Hole Concentrations ( E E
FF= E = E
T T) )
ET energy of the trap level in the bandgap
n1 density of electrons in the conduction band for EF = ET p1 density of holes in the valence band for EF = ET
0 0 2 1
1 exp n n p
kT E N E
N p
n c v v c⎟= i =
⎠
⎜ ⎞
⎝
⎛ −
=
Shockley
Shockley- -Read Recombination Read Recombination
p n
p n
Nt
σ σ
ν ν
and
and
: the concentration of the traps
: the electron and hole thermal velocities : the capture cross sections of the traps
n n t n
p p t p
N C
N C
σ ν
σ ν
=
=
Ref) W. Shockley and W. T. Read
probability per unit time that a hole in the valence bandwill be captured at the traps filled with electrons probability per unit time that an electron in the conduction bandwill be captured at the empty traps
The net capture rate of electrons in conduction band
)
11
( f n C f n
C
R
cn=
n−
t−
n t The net capture rate of holes in valence band)
11
( f p
C p f C
R
cp=
p t−
p−
tf
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Non-radiative recombination rate by Shockley-Read Recombination
( ) ( ) [ ]
(
n n n)
C(
p p p)
C
n p n n p p C C p
p C n n C
n p pn C R C
p n
p n p
n p n
SR Δ Δ
Δ Δ
+ + +
+ +
− +
= + + + +
= −
1 0 1
0
1 1 0
0 1
1
1
1 ) ( )( )
(
2 0 0 1
1p n p ni
n = =
( n n n ) C ( p p p )
C
n p n p p R n
p n
SR
Δ Δ
Δ Δ Δ Δ
+ + +
+ +
+
=
−+
−1 0 1 1
0 1
0 0
Shockley
Shockley- -Read Recombination Read Recombination
For steady-state conditions,
R
cn= R
cp= R
SR) ( ) 1 (
) ( ) (
1 1
1 1
1 1
p p C n n C
p C n f C
p p C n n C
p C n f C
p n
p n t
p n
p n
t + + +
= + + −
+ +
= +
Non- Non -radiative Lifetime by Shockley radiative Lifetime by Shockley- -Read Read
(
n n n)
C(
p p p)
C
n n p
n
p Δ Δ
Δ
τ + + + + +
+
= − + −
1 0 1 1
0 1
0
1 0
Thenon-radiative lifetimeof excess electrons can be deduced from the equation RSR = Δn / τ(constant recombination rate) and Δn = Δp.
When small deviation from equilibrium is assumed,
0 1
0
0 , and
p >> n p n<< p
⇒
Δ
n n t n n
σ ν
N C =
=
= 1 1
τ
0τ
p p t p p
N
C ν σ
τ
τ
1 1
0
=
=
=
p-type semiconductor
0 1
0
0 , and
n >> p n n<<n
⇒
Δ
n-type semiconductor
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Non- Non -radiative Lifetime of Intrinsic Materials radiative Lifetime of Intrinsic Materials
When we assume Cn= Cp and very small Δnand Δp
( )(
n n n) (
p p p)
n n Nt n n p
Δ Δ
σ Δ
τ ν + + + + +
+
= +
1 0 1
0
0
1 0
⎟⎟⎠
⎜⎜ ⎞
⎝
⎛
+ + +
=
0 0
1
1 1
0 p n
n p
τ
nτ
For the special case of intrinsic materials, ⇒ n0 =p0 =ni
( )
( ) ( ( ) )
( )
( ) ( ( ) )
⎥⎦⎤
⎢⎣⎡ + − + − −
=
⎥⎦
⎢ ⎤
⎣
⎡ + − + −
=
⎟⎟⎠
⎜⎜ ⎞
⎝
⎛ + +
=
2
/ exp
/ 1 exp
2
/ exp
/ 1 exp
1 2
0 0 0
1 1
kT E E kT
E E
n
kT E E n
kT E E n
n n p
Fi T Fi
T n
i
T Fi i
Fi T i
n
i n
i
τ τ τ τ
(
0 10) (
00 1)
0
1
p p n n
n p
n + + +
= + τ
•When the trap level is at or close to the mid-gap energy
( ET– EFi= 0 ), the non-radiative lifetime is minimized ( τ= 2τn0 ).
ÎMid-gap levels are effective non-radiative recombination centers.
•As T increases, the non-radiative recombination lifetime decreases.
ÎThe radiative band-to-band recombination efficiency decreases at high temperatures.
•Some devices are based on radiative recombination through a deep state. ex) N-doped GaP
ÎThe deep-level recombination rate increases with
⎥⎦
⎢ ⎤
⎣
⎡ ⎟
⎠
⎜ ⎞
⎝
⎛ −
+
= kT
E ET Fi
n
i 1 cosh
τ 0
τ
Non- Non -radiative Lifetime of Intrinsic Materials radiative Lifetime of Intrinsic Materials
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Visualization of Defects Visualization of Defects
• Clusters of defects or extended defects (dislocations) ÎLuminescence-killing nature
• Luminescence in the vicinity of the defects is reduced due to the non-radiative recombination channels.
Luminescence from Deep
Luminescence from Deep- -level Transition level Transition
• While most deep-level transitions are non-radiative, some deep-level transitions are radiative.
• n-type GaN / sapphire
365 nm : band-to-band transition
~ 550 nm : deep-level transition (related to V )
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Auger Recombination Auger Recombination
• The electron-hole recombination energy ( ~ Eg)
ÎExcitation of a free electron high into the conduction band or a hole deeply excited into the valence band
• The highly excited carriers will subsequently lose energy by multiple phonon emissionuntil they are close to the band edge.
p n C R
np C R
n Auger
p Auger
2 2
=
= p-type semiconductor ( 2 holes + 1 electron ) n-type semiconductor ( 1 holes + 2 electron ) Cp Auger coefficient in valence band
Cn Auger coefficient in conduction band ÎOwing to the differences in conduction and valence band
structure in semiconductors, Cpand Cnare generally different.
Auger Recombination Auger Recombination
• In the high-excitation limit, the non-equilibrium carriers have a much higher concentration than equilibrium carriers.
p n ≈
⇒
(
C C)
n3 Cn3RAuger = p+ n =
C : Auger coefficient
10-28~ 10-29cm6/s for III-V semiconductors
Î Auger recombination reduces the luminescence efficiency at very high excitation intensity.
Î At low carrier concentrations, the Auger recombination rate is very small and negligiblefor practical purposes.
n3
RAuger∝
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Non- Non -radiative Recombination at Surfaces radiative Recombination at Surfaces
Band diagram model
• This model is based on the strict periodicity of a crystal lattice.
• Surfaces are strong perturbation of the periodicityof a crystal lattice.
Î The modified band diagram at a semiconductor surface.
(the addition of electronic states within the forbidden gap)
Chemical point of view
• Atoms at the surface cannot have the same bonding structure as bulk atoms due to the lack of neighboring atoms.
• Some of the valence orbitals do not form a chemical bond.
Îdangling bonds
• These partially filled electron orbitals are electronic states that can be located in the forbidden gap.
Non- Non -radiative Recombination at Surfaces radiative Recombination at Surfaces
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Surface Recombination Surface Recombination
( )
⎥ ⎦
⎢ ⎤
⎣
⎡
+
− − +
= +
=
∞S L
L x n S
n x n n x n
n n
n n
τ Δ τ
Δ ( ) 1 exp /
)
(
0 0Assuming
p-type semiconductor
uniform steady-state generation rate ex) illumination
S surface recombination velocity x distance from semiconductor surface Ln carrier diffusion length
0 0
) 0 ( , For
) 0 ( , 0 For
n n S
n n n S
→
∞
→
+
→
→ Δ ∞
Non-radiative recombination at the surface
Æreduced luminescence efficiency & heating of the surface 101cm/s Si
103cm/s InP
106cm/s GaAs
S
Demonstration of Surface Recombination
Demonstration of Surface Recombination
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Concentration of Native Defects Concentration of Native Defects
•Any semiconductor crystal will have some native defects.
ÎEven though the concentration of these native defects can be low, it is never zero.
•Ea : energy to create a specific point defect in a crystal lattice Probability that such a defect indeed forms at a specific lattice site
= exp ( – Ea/ kT)
•Concentration of specific point defects
( E kT )
N
N
defect= exp −
a/
N : concentration of lattice sites
Internal Luminescence Efficiency Internal Luminescence Efficiency
•In the 1960’s,
~ 1 %of the internal luminescence efficiencies (RT)
•At the present time,
> 90 %of the internal luminescence efficiency (RT) Î improved crystal quality
reduced defect and impurity concentration quantum well structures
1 1 1
− − −
−
= τ
rad+ τ
non radτ
1 1
1
int −
−
−
−
= +
rad non rad
rad
τ τ
η τ
Internal quantum efficiency
τ carrier lifetime
τrad radiative carrier lifetime τnon-rad non-radiative carrier lifetime ηint internal quantum efficiency