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trend powe powe elect contr we w comb in ter custo of th The simu Keyw PAC

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Anbarasu School of 11007, D

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An adde d in Nanote er. The Sing er dissipatio tronics devi

rol the moti were used 2

bination of rms of dela om design a he supply-vo

Low-Powe ulated by PS words: SET CS: 73.23.H

1. Intro

The perf performanc volution, co uits is influe

ided to the ented each d

The arith nergy consu

ber and den wing techno

op compute hnology syst

ly leads to p

r corresponde

ower and

u Paulthura f Electronics Dar-Es-Salaa

d 30 July 201

ct

er is an imp echnology i

gle Electron on, high sp ces to repla ion of indiv 24 SET and

input voltag ay, area, po and layout in

oltage scalin er and High SPICE 9.1.

T, Full Adde Hk; 85.35.Gv

oduction

formance of ce of the orrelation an enced by h

designer an day, the pow hmetic circu umption is b nsity of tra ologies in m ers Requires

tems since power consu

ence, E-mail: a

high-per

ai*, Balamur and Telecom m, Tanzania

2; Revised 1

portant elem s moving t n Transistor peed and hi ace conventi vidual electr

d 14 resisto ge. This wo ower, and th n SET proce ng on reduc h-Performan

er, High-Sp v; 85.35.-p.

f many app arithmetic nd digital fi

ow the arit nd used for wer consum uits grows m becoming m ansistors on mobile elec s the use o it is the cor umption red

anbarasu_003

rformance

rugan Dharm mmunication a.

14 Aug. 2012

ment of all towards the r (SET), dis igh perform ional CMO rons in the d ors. The cir ork evaluate heir produc

ess technolo cing the pow

nce 1-Bit S

peed.

plications su circuits to filtering. U thmetic ope synthesizin mption becom

more compl more importa

n a chip an ctronic dev of a Single re element o duction.

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e 1-bit set

maraj n, St. Joseph

2; Accepted 3

the arithme need of th stinguished mance, is on

S. The SET designed cir rcuit is fun es the perfo ts by hand ogy. Also sh wer expend Set Full-Ad

uch as digita o execute Usually, the erators are ng. As more mes more im lex with the

ant now tha nd faster clo

ices such a e Electron T

of arithmetic

t Full-add

University in

30 Oct. 2012

etic and log he devices,

by a very s ne of the m T technology rcuits. In th

ctioning as rmance of t with logica hown is the ded by leaka

dder digital

al signal pr complex performan implemente e complex a

mportant.

increasing an ever due ock Increas as cellular Transistor F c circuits. D

der

n Tanzania, P

2

gic units. T which cons small device most promis y offers the his Full Add s required f the propose al effort an e considerab

age and sho l circuits h

rocessing de algorithms nce of the i ed in the ce arithmetic ci processor b to the incre sing deman

phones, PD Full Adder Decreasing t

P.O Box

The recent sume low e size low sing nano e ability to der Circuit for all the ed designs

d through ble impact ort-circuit.

have been

epends on such as integrated ell library ircuits are bus width, ease in the d for fast DA’s and r in Nano the power

(2)

Anbarasu Pa

106 S controlle size and electron.

of the ele solutions electron 1992 [2]

correspon logic.

2.

S few nano SET cons by tunne transistor effect. Th transmit number o tunnel jun

3.

Q single ele greater th QD. This For QD, in atoms wave fun propertie consider The nano oxide or model ea capacitor depends and C2, current, between (discharg equation

aulthurai, Balam

ingle elect d electron t ultra-low p In 1987, L ectrons is co s have been inverter, m ]. This wor nds to the P

. Basic Ph

ingle Electr ometer usin

sists of a sm el junctions

r, Single ele he electrica the electro of electron nction divid . Quantum

Quantum do ectron can han the the s sensitivity

the discrete and molec nctions betw es of a mol

a metal na oparticle is

organic m ach of the r. The resi

on the size and the ap I depends the electr ging) from

1.

murugan Dharm

ron transis tunneling to ower dissip Likharev has ontrolled by developed made from tw

rk explaine PMOS and N

hysics of SE

ron Transis ng metal, se mall conduc s and capac ectron devic al behaviou on wave, w waves mod ded by the s m Dot [Qd]

ot [QD] is a cause a ch ermal energy y to individu e energy lev cules, so on ween two q lecule. To anoparticle separated molecules so

nanopartic stance is d e of the par pplied volta on V. Whe rodes beca

an initially

maraj / Low-pow

tor (SET) o amplify cu

pation and b s proposed a y a bias appl

on logic cir wo comple ed the prin NMOS tran

ET Operati

stor [SET] h emiconduct cting island

ctively cou ce based on ur of the tun which decrea des that imp

square of wa ]

a mesoscop hange in the

y and can c ual electron vel of the ele

e can talk a quantum do

understand sandwiched from the e o that only

cles-electrod determined

ticle. We d age between

en we start ause movem y neutral na

wer and high-p

is a new urrent. SET based on co a single-ele lied at the c rcuits, mem ementary SE nciples of d nsistors, wh

ion

has been m tor, carbon [Quantum upled to on n an intrinsic

nnel junctio ase expone pinge on the

ave length.

pic system i e electrosta control the ns has led to ectrons in th about “artif ots overlap,

the electro d between t electrodes b tunneling de junction

by the ele denote the r

n the electr t to increas ment of a anoparticle

erformance 1-b

type of s is distingui ontrolling th ectron transi center electr mory and oth

ETs was pr designing c hich can be u

made with c nanotubes Dot] couple ne or more

cally quantu on depends entially with e barrier, w

in which th atic energy electron tr o electronic he QD beco ficial atoms

the couple on transpor two metal e by vacuum

is allowed ns with a

ectron tunn resistors and rodes by V

se V from an electron cost energ

bit set Full-adde

witching d shed by a v he transport

istor in whi rode [1]. Sin

her circuits.

roposed by complemen used to desi

critical dime or individu ed to source

gate. Unli um phenom on how ef h the thickn

hich is give

he addition or Coulom ansport into cs based on

omes pronou and molec d quantum t properties electrodes s or insulatio between th resistor in neling and d capacitors . We will

zero, no c n onto (ch gy by an am

er

device that very small d

of an indiv ich the tunn nce then, va . The first s Tucker et ntary SETs, ign CMOS-

ensions of j ual molecul

e and drain ike Field E menon, the t

ffectively b kness and o en by the ar

or removal mb energy th

o and out o single elec unced, like cules”. Whe dots exhib s in QD. L shown in F on layer su hem. So w parallel w the capaci s by R1, R2

discuss how current can harging) o amount give

uses device vidual neling arious single al. in , that

-style

just a les. A leads Effect tunnel barrier on the

rea of

l of a hat is of the trons.

those en the bit the Let us Fig. 1.

uch as e can with a itance

2, C1 w the flow r off en by

(1)

(3)

throu volta

expe Vth, volta remo the a curre Coul

publi cond arbitr comp can b tunne capac junct circu

trans show tunne way throu throu we h

This sup ugh the nan age φ at the

This volt ct a flat zer an electro age, the cu ove) two ele applied volt ent starts to lomb stairca

4. Sing

The pri ications [6, ducting isla

rarily conn ponent of si be consider el junction citance Cj a tion and the uits is the Co 5. Struct

Single-e sfer electron wn in Fig. 1.

el junction for electron ugh the insu ugh the tunn have three t

ppression of noparticles

nanoparticl

tage is calle ro-current r on is added urrent does ectrons onto tage is large o increase ase.

gle Electron

incipals of 7]. Summa ands, tunne nected with ingle electro red as two

and its sch and a resista e thickness oulomb blo

ture of Sin

lectron tran ns form so . A SET is m

consists of ns in one of ulator. Sinc nel junction terminal So

f electron fl only when les such tha

ed threshold regime with d to (remov

not increa o the nanop e enough to again. This

Fig. 1:

n Tunneling

f single-ele arizing, in t l junctions h tunnel ju on tunnelin conductors hematic dia ance Rj, eac of the insu ckade [5].

gle-Electro

nsistors (SE urce to dra made from t two pieces f the metal ce tunneling n flows in m ource, Drain

low is calle the applied at

d voltage an h a width of ved from) ase proporti particles, wh o overcome s leads to

Quantum D

g

ectron elec the single-e s, capacitor unctions, ca ng technolog s separated agram are ch of which ulator. The

on Transist

ETs) are thr ain one by two tunnel j of metal se electrodes g is a discr multiples of n and Gate

d Coulomb d voltage V

nd denoted

f 2 Vth. Wh the nanopa ionally bec hich cost a the Coulom a stepwise

ot Structure.

ctronics ha electron tec rs, and vol apacitors an

gy is the tun by a thin shown in F h depends o

fundamenta

tors

ree-termina one. The s junctions th eparated by to travel to rete process f e, the charg

. As shown

blockade.

V is large en

by Vth. So hen the app articles. Fu ause it req greater amo mb energy o e increase i

ave been p chnology, th

ltage sourc nd voltage nnel junctio

layer of in Fig. 2. It is

n the physic al principle

l switching schematic s hat share a c y a very thin

the other e s, the electr

ge of a sing n in the fig

Current sta enough to e

in the I-V plied voltag urther incre quires us to

ount of ener of two elec in I-V curv

presented he circuits c ces. The is

sources. T on. A tunne nsulating m s characteri cal size of t of SET de

g devices, w structure of common ele n insulator.

electrode is ric charge t gle electron gure, the str

107 art to flow establish a

(2) curve, we ge reaches easing the

o add (or rgy. Once ctrons, the ve, called

in many consist of lands are The basic el junction material. A ized by a the tunnel evices and

which can f SETs is ectrode. A

The only to tunnel that flows [3]. Here ructure of

(4)

Anbarasu Pa

108 SETs is a place of p the MOS

6.

In in circui consume switching when bo current fr only a m relatively in SET ci it make u T leakage p does not the therm due to th total pow

B both the supply v construct T addend A outputs th F Full-Add constant inputs (A which co

aulthurai, Balam

almost the pn-junction SFETs [1, 8]

. Low-Pow

n general, th t operation d due to th g occurs, a oth the NSE from the sup minor fracti

y large com ircuits is als up a conside The most sig

power. An change. Ho mal enhance he thermal e wer as the op Because the current lev voltage scal ting low-po The 1- Bit S

A (1-bit pre he sum S, a ig. 3 show der circuit. I and its valu A, B and Ci

orresponds t

murugan Dharm

same as tha ns of the MO

].

F

wer and Hi

here are thre n: dynamic,

he charging and thus, is ET and PS pply to the ion of the mpared to th so a functio erable portio

gnificant co ideal comp owever, in ement of no enhancemen

peration tem dynamic po vel and volt

lability, wh wer SET ci SET Full-ad

ecision), the and the carry s an Intern It consist of ue is 25 mV

in respective to the logic

maraj / Low-pow

at of MOSF OSFETs an

Fig. 2: Schem

igh-Perform

ee compone short-circu g and disch

inevitable SET are tur

ground. Th total dissip he input rise n of operati on of the tot omponent o plementary

a circuit co ormal tunne nt of normal mperature in ower has a tage level r hile device

rcuits.

dder is a ba e augend B y-out Co. nal Circuit o

f 14 PSET a V. The volta ely) of the f

`0', and 25

wer and high-p

FETs. Howe nd a quantum

matic structur

mance 1-Bi

ents that con uit, and lea harging of t

in circuit rned-on sim he power res

pation, as lo e and fall ti

ion tempera tal power.

of the powe circuit doe omposed of eling and c l tunneling ncreases.

quadratic d rise as the

parameters asic arithme B (1-bit pre

of Low-Pow and 14 NSE age sources full-adder a

mV which

erformance 1-b

ever, SETs m dot in pla

re of SET.

it SET Full

nstitute the akage pow the output c

operation.

multaneousl sulting from

ong as the mes. Howe ature, and, a er consume es not dissip f SETs, leak co-tunneling makes up a dependence dimensions s remain co

etic block w ecision), and

wer and Hi T Transisto V1, V2 and and it can correspond

bit set Full-adde

have tunne ace of the c

l-Adder

amount of p er. The dy capacitance Short-circu ly, conduct m the short- output tran ever, the sho as the tempe ed in the SE

pate power kage power g. The static a considerab

on the sup of SETs a onstant, is which has t d the carry- igh-Perform or. The supp V3, shown take only tw ds to the log

er

eling junctio channel regi

power cons ynamic pow e CL when uit power o ting short-c -circuit curr ansient time ort-circuit p erature incre ET circuit r when the r is dissipat

c leakage p ble portion o pply-voltage

are scaled d a key fact three inputs -in (Ci) and mance 1-Bit

ply voltage V in Fig. 2, ar wo values 0 gic `1'. The

ons in ion of

umed wer is

logic occurs circuit rent is es are power

eases, is the

input ed by power of the e, and down, tor in s (the d two t SET Vdd is re the 0.0 V input

(5)

109 voltage V1(A) is applied to PSET 1, 4, 7, 10 and NSET of 21, 18, 24, 26 through gate, input voltage V2(B) is applied to PSET 2, 3, 5, 14 and NSET of 17, 19, 20, 22 through gate, and the input voltage V3(Cin) is applied to PSET 6, 8, 13 and NSET of 15, 16, 28 through gate.

The output signals of the full-adder sum is taken from source of PSET 9 and drain of NSET 27, and N6, and the Carry is taken from source of PSET 11 and drain of NSET 25. The presence of positive charge corresponds to logic `1', whereas no charge corresponds to logic

`0'.

Fig. 3: Internal Circuit of Low-Power and High-Performance 1-Bit SET Full-Adder.

(6)

Anbarasu Pa

110 7.

T time vari possible output su is logic ‘ logic ‘0’

sum and

8.

T Adder lo scaling is circuit. S 20% of operation are verifi measured Area, an increased adder rea F

Fu applicatio dissipatio

aulthurai, Balam

. Simulati

The logic op iation of th combinatio um and carr 1’ and carry

and carry i carry is log

Fig. 4: S

. Conclusi

The Design ogic circuits s an effecti Simulation r V mDD to n of SET fun fied for the d and tabula nd Delay ar d possibility alizations ca Future Wor

urther this ons. Due t on it can be

murugan Dharm

ion Results

peration of th he input V1

ns of logic ry respectiv y is logic ‘0 is logic ‘1’.

gic ‘0’.

Simulated inp

ion

considerati s have been

ve method results revea maintain o nction base input set a ated. 1 bit S re reduced y for high an be consid rk

s multiplier to the incre used for DS

maraj / Low-pow

he full-adde and V2, re

‘0’ and ‘1’

vely. When 0’. When w When we a

put (A B C) a

ons for Low investigate for the red al that the su overall circu

d adder and and the per SET full ad

than their reduction in dered as a b

r can be ease in spe SP applicati

wer and high-p

er is shown espectively.

to the circu we applied we applied in applied inp

and Simulate

w-Power an ed. It has al duction of p upply-volta uit perform d the circuit

rformance m dder shows

r conventio n power di best choice f

implement eed of mu ions.

erformance 1-b

in Fig. 4. I The piecew uit. The rem

input volta nput voltage

ut voltage [

ed output (SU

nd High-Pe lso been sho power consu age scaling s mance. Truth t is designed metrics of

55% reduct nal adders.

issipation a for the mult

ted in filt ultiplier and

bit set Full-adde

In this first wise consta aining 2 row age [0 0 1] t

e [0 1 1] the [0 0 0] then

UM & CARR

erformance own that the umed by lea should be c h table is a d using PSP

the efficien tion of pow . As techno and area. So

ipliers.

ers for im d high redu

er

3 rows sho ant and app ws are show

then we ge en we get s n we get the

RY).

1-Bit SET he supply-vo akage and s carried out w achieved fo PICE 9.1 Ou nt full adde wer consump

ology scali o 1 bit SET

mage proce uction in p

w the ply all ws the

t sum um is e both

Full- oltage

short- within or the utputs er are

ption.

ing is T full

essing power

(7)

111 Acknowledgement

I would like to thank my friends and my faculty members without whom this Journal would have been a distant reality. I also extend my heartfelt thanks to my family and well- wishers.

References

[1] Likharev, K. K, IEEE Trans. Magn. 23 (1987) 1142 [2] Tucker, J. R, J. Appl. Phys. 72 (1992) 4399

[3] Anbarasu Paulthurai, Balamurugan Dharmaraj, International Journal of Computer Applications, 42 (2012) 0975

[4] Mawahib H. Sulieman, Valeriu Beiu, IEEE, 4 (2005) 669 [5] M. M. Abutaleb, Microelectronics Journal, 43 (2012) 537

[6] S. M. Goodnick, J. Bird, IEEE Trans. Nanotechnol. 2 (2003) 368

[7] A. N. Korotkov, R. H. Chen, K. Likharev, J. Appl. Phys. 78 (1995) 2520

[8] U. Hashim, A. Rasmi, S. Sakrani, Int. J. Nanoelectronics and Materials, 1 (2008) 21

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