Technic and Fabrication of Lithography
X-Ray lithography dan E-beam lithography
Mochamad Zakki Fahmi,
Ph.DDepartment of Chemistry, Airlangga University
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Lithography
• Lithography (from Ancient Greek λίθος, lithos, meaning 'stone', and γράφειν, graphein, meaning 'to write') is a method of printing originally based on the immiscibility of oil and water.
• For nano class well-known as nanolitography
Nanolitography
Optical Lithography
Electron beam Lithography
Multi photon
lithography Xray
lithography
Scaning Probe Lithography
lithographyAFM
Dip pen Lithography Nanoimprented
ithography
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Optical lithography
• Optical lithography, or photolitography, which has been the predominant patterning technique since the advent of the semiconductor age.
• Basically, it is a process used in microfabrication to pattern parts of a thin film or the bulk of a substrate.
• It uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical "photoresist", or simply "resist,"
on the substrate.
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X-ray Lithography
Process which uses X-ray to transfer a geometric Pattern from a mask to the resist on the
substrate
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MAPPER system
For the video, see http://www.mapperlithography.com/technology.html
At present, MAPPER system seems to be the most promising multi-beam direct write system. (IMS at Vienna described in previous slides focused more on ion beam lithography)A few demo-tools have been shipped to semiconductor
industry.
Raster scan, beam blanker by optical control
