㸯
㸯㸬ᶵჾศᯒศ㔝ࡢ┠ⓗ
ᶵჾศᯒศ㔝ࡣࠊᏛෆእࡢඹྠᩍ⫱◊✲ᨭタࡋ࡚ࠊᆺศᯒᶵჾ➼ࢆ㞟୰⟶⌮ࡋࠊᒱ㜧Ꮫ
࠾ࡅࡿᩍ⫱ཬࡧ◊✲ࡢ⏝౪ࡍࡿࡶࠊศᯒᢏ⾡ࡢ◊✲ࠊ㛤Ⓨ➼ࢆ⾜࠺ࡇࢆ┠ⓗࡍࡿࠋ
㸰㸬ἢ㠉
㸳㸳ᖺᗘ ᒱ㜧Ꮫ⤫ྜ⛣㌿క࠸ࠊᏛෆඹྠᒱ㜧Ꮫሗ࣭ィ ࢭࣥࢱ࣮ࢆタ⨨ࠋ
㸳㸶ᖺᗘ ᒱ㜧Ꮫィ ࢭࣥࢱ࣮ཬࡧᒱ㜧Ꮫሗฎ⌮ࢭࣥࢱ࣮ᨵ⤌ࠋ ᖹᡂ 㸷ᖺᗘ ┬௧క࠸ࠊᒱ㜧Ꮫᶵჾศᯒࢭࣥࢱ࣮ࡋ࡚᪂ࡓⓎ㊊ࠋ
⣸እྍどศගගᗘィ㸦᪥❧U 4000ᆺ㸧ࢆタ⨨ࠋ
ᖹᡂ㸯㸮ᖺᗘ ⥲ྜሗฎ⌮ࢭࣥࢱ࣮ࡢ⛣タక࠸ࠊࢭࣥࢱ࣮ෆࡢ୍㒊ᨵࢆ⾜࠺ࠋ ᶵჾศᯒᐊ㸳ࠊົᐊࠊࢭࣥࢱ࣮㛗ᐊࠊᩍᐁ◊✲ᐊࢆቑタࠋ
㉸㧗㏿ᗘ⌧㇟ゎᯒࢩࢫࢸ࣒㸦㉸㧗㏿ᗘᙳ⨨࢘ࣝࢺࣛࢼࢵࢡFS501ࠊ
㧗㏿ᗘࣅࢹ࢜⨨ࢥࢲࢵࢡ࣭࢚ࢡࢱࣉࣟHS-4540-2ࠊᇼሙ〇సᡤ࣭㛫ศゎ⺯ගศග ගᗘィ⨨NASE-700D➼㸧ཬࡧ㉮ᰝᆺࣉ࣮ࣟࣈ㢧ᚤ㙾ࢩࢫࢸ࣒㸦ࢭࢥ࣮ࣥࢫࢶ
࣓ࣝࣥࢶ SPI3800 ࢩ࣮ࣜࢬ㸪ᕤᏛ㒊ࡼࡾ㸧ࢆタ⨨ࠋ㉸㧗⏬㉁ࣇ࣮ࣝ࢝ࣛࢹࢪࢱࣝࣉ
ࣜࣥࢱ࣮㸦ᐩኈ┿ࣇ࣒ࣝ ࣆࢡࢺࣟࢢࣛࣇ࣮4000㸧ࢆタ⨨ࠋ
ᖹᡂ㸯㸯ᖺᗘ 㟁Ꮚ㢧ᚤ㙾ࡢ㝃ᒓ⨨ࠊ㹖⥺ศᯒ⨨ࢹ࣮ࢱฎ⌮㒊 KevexELTA PC ᥋⥆࢟ࢵࢺ
FLAMEࢆタ⨨ࠋ
ᖹᡂ㸯㸰ᖺᗘ 㧗ศゎ⬟㉁㔞ศᯒ⨨㸦᪥ᮏ㟁Ꮚ GC Mate II GCMSsystem㸪ᕤᏛ㒊ࡼࡾ㸧ཬࡧ᭷ᶵᚤ 㔞ඖ⣲ศᯒ⨨㸦ࣖࢼࢥ 㹁㹆㹌ࢥ࣮ࢲ࣮MT-6ࠊ㓟⣲ศᯒ࢟ࢵࢺࠊ࣮࢜ࢺࢧࣥࣉ࣮ࣛ
MTA-620㸧ࢆタ⨨ࠋ
ᖹᡂ㸯㸱ᖺᗘ Ⰽᛶศᩓィ㸦᪥ᮏศග J-820P㸧ࢆタ⨨
ᖹᡂ㸯㸲ᖺᗘ ࣇ࣮࢚ࣜኚ᰾☢Ẽඹ㬆⨨㸦᪥ᮏ㟁Ꮚ JNM-ECA500࣭㟁Ꮚࢫࣆࣥඹ㬆⨨㸦᪥ᮏ 㟁Ꮚ JES-FA100㸧ࢆタ⨨ࠋ㸦ඹ㐃㎰Ꮫ㝔ࡼࡾ㸧
㉮ᰝᆺ㟁Ꮚ㢧ᚤ㙾㸦᪥❧ S-4300㸧ཬࡧࣇ࣮࢚ࣜኚᆺ㢧ᚤ㉥እศගගᗘィ㸦᪥ᮏศ
ග IRT-30-16㸧ࠊ 㢧ᚤ࣮ࣞࢨ࣮࣐ࣛࣥศගࢩࢫࢸ࣒㸦᪥ᮏศග NRA-1000㸧ࢆタ⨨ࠋ
」ྜᆺ⾲㠃ศᯒ⨨㸦ᓥὠ ESCA-3400 ᕤᏛ㒊ࡼࡾ㸧ࢆタ⨨ࠋ ᖹᡂ㸯㸳ᖺᗘ ࢭࣥࢱ࣮⤫ྜࡼࡾ⏕⛉Ꮫ⥲ྜᐇ㦂ࢭࣥࢱ࣮ᶵჾศᯒศ㔝ᨵྡࠋ
㧗ศゎ⬟㉁㔞ศᯒ⨨㸦᪥ᮏ㟁Ꮚ JMS-700࣭AMSUN200㸧࣭ᾮయࢡ࣐ࣟࢺࢢࣛࣇ
㸦Agilent1100 MS-52011LC㸧࣭㉮ᰝᆺ㟁Ꮚ㢧ᚤ㙾㸦᪥❧ S-3000N㸧࣭⇕ศᯒࢩࢫࢸ࣒㸦ࢭ
ࢥ࣮ EXSTAR6000㸧࣭ࣉ࣮ࣟࣇ㺼ᘧࣇ࣮࢚ࣜኚ㉥እศගගᗘィ 㸦⡿ᅜASI Applied
Systems ♫ ReactIR 400F-GU㸧࣭᥋ゐᆺ㢧ᚤ㙾ࣇ࣮࢚ࣜኚ㉥እศගගᗘィ㸦⡿ᅜࢭ
ࣥࢧ࣮ࢸࢡࣀࣟࢪ࣮ࢬ♫ IlluminatIR 㸧࣭PIV ࢩࢫࢸ࣒(㸺࣮ࣞࢨ࣮㸼࢝ࣥࢸࣝ♫
TwinsUltra120࣭ 㸺࣓࢝ࣛ㸼 ࢜ࢵࢡࢫࣇ࢛࣮ࢻ࣮ࣞࢨ࣮♫ ES1.0-NI1422࣭㸺ࣉࣟࢭ
ࢵࢧ㸼᪥ᮏ࣮ࣞࢨ࣮♫ VPP-2D)ࢆタ⨨ࠋᶵჾศᯒศ㔝㤋ࡢ✵ㄪࢩࢫࢸ࣒ࢆ⠇㟁ᆺ ࡢࡶࡢ᭦᪂ࠋ
ᖹᡂ㸯㸴ᖺᗘ ᾮయ❅⣲࢞ࢫ㈓ⶶタࡢᗫṆࠋ
ᆺ⢭ᐦᶵჾ㧗ᗘ⏝බ㛤ࢭ࣑ࢼ࣮㛤ጞࠋᏛእྥࡅࡢཷクヨ㦂ไᗘࢆᩚഛࠋ ᖹᡂ㸯㸵ᖺᗘ ⏕⛉Ꮫ⥲ྜ◊✲ᨭࢭࣥࢱ㸫ྡ⛠ኚ᭦ࠋ
ࣇ࢙࣒ࢺ⛊ࣇࣂ࣮࣮ࣞࢨ࣮㸦ࢩࣥ⢭ᶵ ࣇ࢙࣒ࢺࣛࢺ BS-60-YS㸧ࢆタ⨨ࠋ
ࢿ࢜࢜ࢫ࣑࣒࢘ࢥ࣮ࢱ࣮㸦┕ၟ NE-01044㸧ࢆタ⨨ࠋ ᶵჾศᯒศ㔝㤋ෆዪᏊࢺࣞࢆ᪂タࠋ
ᖹᡂ㸯㸶ᖺᗘ ⋞㛵⮬ືࢻࢆタ⨨ࠋ
ᶵჾ᭦᪂క࠸ࠊᶵჾᐊ㸯࣭ᶵჾᐊ㸲࣭✵ㄪᐊࢆᨵಟࠋ
ࣇ࣮࢚ࣜኚ᰾☢Ẽඹ㬆⨨㸦᪥ᮏ㟁ᏊJNM-ECX400P࣭JNM-ECA600㸧ࢆタ⨨ࠋ
㧗ศゎ⬟㟁⏺ᨺฟᆺ㉮ᰝ㟁Ꮚ㢧ᚤ㙾㸦᪥❧ S-4800㸧ࢆタ⨨ࠋ
࣑࢜ࣥࣜࣥࢢ⨨㸦᪥❧ E-3500㸧ࢆタ⨨ࠋ
ࢸࣛ࣊ࣝࢶศග㉮ᰝᆺ㢧ᚤ㙾㸦࢜ࢨ࣡ THz-TDS㸧ࢆタ⨨ࠋ ࢫࢺࢵࣉࢺࣇ࣮ࣟศගගᗘィ㸦ሯ㟁Ꮚ RA-401㸧ࢆᗫᲠࠋ
࣮ࣞࢨ࣮↷᫂⨨㸦NAC lS20-30㸧ࢆᕤᏛ㒊⟶⌮࠼ࠋ
㉸㧗⏬㉁ࣇ࣮ࣝ࢝ࣛࢹࢪࢱࣝࣉࣜࣥࢱ࣮㸦ᐩኈ┿ࣇ࣒ࣝ ࣆࢡࢺࣟࢢࣛࣇ࣮
4000㸧ࢆᛂ⏝⏕≀⛉Ꮫ㒊⟶⌮࠼ࠋ
ᖹᡂ㸰㸮ᖺᗘ ㄏᑟ⤖ྜࣉࣛࢬ࣐Ⓨගศᯒ⨨㸦᪥ᮏ㟁Ꮚ ࣮࣐ࣜࣥ PS-1000UV㸧ࢆᗫᲠࠋ ㄏᑟ⤖ྜࣉࣛࢬ࣐Ⓨගศᯒ⨨㸦ᇼሙ࣭JOVIN㸧ࢆタ⨨ࠋ
ᖹᡂ㸰㸯ᖺᗘ ᆺ㟁Ꮚ㢧ᚤ㙾㸦㏱㐣ᆺH-8100ᙧ㸧ࠊ」ྜᆺ⾲㠃ศᯒ⨨㸦ᓥὠ ESCA-3400㸧ࠊᘬఙ ᶵ࠾ࡼࡧࢹ࣑ࣗࣝ࢜ࣥࣜࣥࢢࢆᗫᲠࠋ
ᆺ㟁Ꮚ㢧ᚤ㙾㸦㏱㐣ᆺH-7000ᙧ㸧ࠊCCD࣓࢝ࣛ㸦㏱㐣ᆺH-7000ᙧ㸧⏝ࢆタ⨨
YAG᳨ฟჾ㸦SEM-4800㸧⏝ࢆタ⨨
ᆺ㟁Ꮚ㢧ᚤ㙾㸦㏱㐣ᆺJEM-2100ᙧ㸧ࢆタ⨨ࠋ
ᆺ㟁Ꮚ㢧ᚤ㙾タ⨨క࠸TEMᐊࡢᨵಟ
⢭ᐦ࣏࢜ࣥࣜࢵࢩࣥࢢ⨨ࢆタ⨨ࠋ
᪂ศ㔝㛗㉱௵క࠸ࠊᩍဨᐇ㦂ᐊ㸦ᬯᐊྵࡴ㸧ࡢᨵಟࠋ ᶵჾᐊ㸱ᡬࡢᨵಟࠋ
ᾮ❅⣲࣎ࣥ࣋ࡢ㓄⟶ᕤ࠾ࡼࡧᆅ㟈ᑐ⟇Ᏻᕤࠋ ᖹᡂ㸰㸰ᖺᗘ X⥺࣐ࢡࣟCTࢫ࢟ࣕࢼ㸦Skyscan 1172㸧ࢆタ⨨ࠋ
⢏Ꮚᚄ࣭⢏Ꮚᙧ≧ ᐃ⨨㸦FPIA-3000㸧ࢆタ⨨ࠋ
⢏Ꮚᚄ࣭ࢮ࣮ࢱ㟁࣭ศᏊ㔞 ᐃ⨨㸦ࢮ࣮ࢱࢧࢨ࣮ࢼࣀZS㸧ࢆタ⨨ࠋ ࢹࢪࢱ࣐ࣝࢡࣟࢫࢥ࣮ࣉ㸦DVM-5000㸧ࢆタ⨨ࠋ
᪕ගᗘィ㸦P-2300㸧ࠊ࣓࣮ࣞ࢜ࢱ࣮㸦AR-Gϩ KG㸧ࠊືⓗ⢓ᙎᛶ ᐃ⨨㸦DMA Q800
KG㸧ࠊ㉸㡢Ἴࢹࢫࢡ࢝ࢵࢱ࣮ 㸦MODEL 601㸧ࠊࢲࣖࣔࣥࢻ࣮࣡ࣖࢯ࣮
㸦DWS3242㸧ࠊࢫࣃࢵࢱࢥ࣮ࢱ࣮㸦SC200㸧ࠊ࣮࢝࣎ࣥࢥ࣮ࢱ࣮㸦CADE-EHS㸧ࠊ⣸እ
ྍどศගගᗘィ㸦UV-Vis㸧ࠊࣇ࣮࢚ࣜኚ㉥እศගගᗘィ 㸦FT-IR㸧ࢆタ⨨ࠋ
࣮࢝ࢻᘧධᐊ⟶⌮ᆺ⋞㛵⮬ືࢻᨵಟࠋ
㸱
㸱㸬⟶⌮㐠Ⴀ⤌⧊ᅗ
㸦 㸧ෆࡣෆ⥺␒ྕࢤ ࣀ ࣒ ◊ ✲ ศ 㔝 ᨺᑕᛶྠඖ⣲ᐇ㦂タ
᎘ Ẽ ᛶ ⳦ ◊ ✲ ศ 㔝
ື ≀ ᐇ 㦂 ศ 㔝 ᶵ ჾ ศ ᯒ ศ 㔝
⏕⛉Ꮫ⥲ྜ◊✲ᨭࢭࣥࢱ࣮㛗
ศ㔝㛗㸦ᑓ௵ᩍဨ㸧 ᑓ ௵ ᩍ ဨ
ศ 㔝 ⫋ ဨ
༠ ຊ ဨ
㏆Ụ 㟹๎ (2037) 㙊㊊ 㞝ྖ (6151)
≟ሯ ಇᗣ (6152)
⋢ᕝ ༤ᗣ (2035)
ᮧ℩⏤⨾Ꮚ ( ࠌ )
ᮡᒣ ▱⨾ ( ࠌ ) 㔠᳃༓⤮⨾ (6603)
㸦ḟ࣮࣌ࢪࢆཧ↷㸧
㸲
㸲㸬ᶵჾศᯒศ㔝༠ຊဨྡ⡙㸦ᶵჾู㸧
㹆㸰㸱㸬㸲㸬㸯
۔㸸ᶵჾྲྀᢅ㈐௵⪅
ᶵ ჾ ྡ Ặ ྡ 㟁ヰ␒ྕ 㒊 ᒁ
࠙ᰗᡞタࠚ
ᆺ㟁Ꮚ㢧ᚤ㙾
㸦㏱㐣ᆺH-7000ᙧ࣭TEM࣭᪥❧㸧
㸦㏱㐣ᆺJEM-2100ᙧ࣭TEM࣭᪥ᮏ㟁Ꮚ㸧
㉮ᰝᆺ㟁Ꮚ㢧ᚤ㙾 㸦S-4300࣭SEMࠊEDX㸧
㉮ᰝᆺ㟁Ꮚ㢧ᚤ㙾 㸦S-3000N࣭SEM㸧
㧗ศゎ⬟㟁⏺ᨺฟᆺ㉮ᰝ㟁Ꮚ㢧ᚤ㙾 㸦S-4800࣭SEM㸧
┿✵╔⨨࣭ࣇ࣮ࣜࢬࣞࣉࣜ࢝⨨
࢜ࣥࢫࣃࢵࢱ࣭
࢚࣏࣮ࣞࢩࣙࣥࣘࢽࢵࢺ㸦࣮࢝࣎ࣥᑓ⏝㸧
ࢹࣥࣉࣝࢢࣛࣥࢲ࣮
࢞ࣛࢫࢼࣇసᡂჾ
㉸࣑ࢡࣟษ∦స〇ࢩࢫࢸ࣒
ࢿ࢜࢜ࢫ࣑࣒࢘ࢥ࣮ࢱ࣮
࣑࢜ࣥࣜࣥࢢ
⢭ᐦ࣏࢜ࣥࣜࢵࢩࣥࢢ⨨
࠙་Ꮫタࠚ
ᆺ㟁Ꮚ㢧ᚤ㙾
㸦㏱㐣ᆺJEM㸫2100FGK࣭TEM㸧
࣮ࣝࢳࣥ⏝ࢡࣜ࢜ࢫࢱࢵࢺ
۔▮ ㇏ ᮾ ⳹ᓅ
ᮡᾆ 㝯 Ḉ⏣ ಟ
ⱥᘯ ᑠᮧ ㈼୍
ྜྷ⏣ 㐨அ
ྜྷᓮ ⠊ኵ 㓇 ὒᶞ ᒾᮏ ᝅᚿ ᱓⏣ ୍ኵ
㸰㸳㸶㸷 㸴㸰㸷㸳 㸰㸳㸷㸮 㸰㸳㸵㸲 㸰㸴㸶㸰 㸰㸴㸮㸮 㸰㸳㸴㸴 㸰㸶㸳㸱 㸰㸷㸳㸵 㸰㸷㸰㸲 㸴㸯㸲㸱
ᕤᏛ㒊
་Ꮫ㒊 ᕤᏛ㒊
ࠌ ࠌ ࠌ ࠌ ᛂ⏝⏕≀⛉Ꮫ㒊
ࠌ ࠌ 㐃ྜ⸆
࠙ᰗᡞタࠚ
㉮ᰝᆺX⥺ග㟁Ꮚศගศᯒ⨨
㸦Quantera SXM-GS㸧
۔ఀ⸨ ㈗ྖ
Ḉ⏣ ಟ
ᮡᾆ 㝯
⚄ཎ ಙᚿ ኟཎ ᐀
᳜ᮧ ୍ᗈ ᯇᮌ ఙ⾜
㸰㸴㸶㸮 㸰㸳㸵㸲 㸰㸳㸷㸮 㸰㸳㸶㸯 㸰㸴㸷㸶 㸰㸳㸴㸯 㸰㸴㸷㸱
ᕤᏛ㒊 ࠌ ࠌ ࠌ ࠌ ࠌ ࠌ
࠙ᰗᡞタࠚ
㧗ศゎ⬟㉁㔞ศᯒ⨨
㸦JMS-700, AMSUN200, GCmate II㸧 ᾮయࢡ࣐ࣟࢺࢢࣛࣇ
㸦Agilent1100-MS-52011LC㸧
࠙་Ꮫタࠚ
᭷ᶵྜ≀⮬ືศྲྀ⢭〇ࢩࢫࢸ࣒
(LC-MS, waters)㸦་Ꮫタ㸧
۔ගỌ ᚭ
ྜྷᯇ ୕༤ ᯇᒃ ṇᶞ
ᮧ
ྜྷ⏣ ᩄ
▼⏣ ᒣෆ ு ᰗ℩ ➗Ꮚ ▮㒊 ᐩ㞝 ᱓⏣ ୍ኵ
㸰㸷㸰㸮 㸰㸰㸳㸯 㸰㸴㸮㸯 㸰㸴㸯㸲 㸰㸴㸳㸳 㸰㸴㸯㸱 㸰㸷㸱㸮 㸰㸷㸯㸲 㸰㸷㸯㸱 㸴㸯㸲㸱
ᛂ⏝⏕≀⛉Ꮫ㒊 ᩍ⫱Ꮫ㒊
ᕤᏛ㒊 ࠌ ࠌ ࠌ ᛂ⏝⏕≀⛉Ꮫ㒊
ࠌ ࠌ 㐃ྜ⸆
࠙ᰗᡞタࠚ
ࣇ࣮࢚ࣜኚ᰾☢Ẽඹ㬆⨨
㸦JNM-ECX400P, JNM-ECA500,ᅛయ JNM-ECA600㸧
࠙་Ꮫタࠚ
ࣇ࣮࢚ࣜኚ᰾☢Ẽඹ㬆⨨
㸦Avance500,Avance600,Avance800㸧
۔‶ ᾈ୍
㒊 ఙ୕
ྂᒣ ᾈᏊ ⧴⧭ Ᏺ ᑠᮧ ㈼୍
❑⏣ ⿱
ගỌ ᚭ ᰗ℩ ➗Ꮚ Ᏻ⸨ ᘯ᐀
᱓⏣ ୍ኵ
㸰㸴㸲㸷 㸰㸰㸳㸱 㸴㸳㸮㸳 㸰㸴㸯㸷 㸰㸴㸮㸮 㸰㸳㸷㸴 㸰㸷㸰㸮 㸰㸷㸯㸲 㸱㸲㸳㸰 㸴㸯㸲㸱
ᕤᏛ㒊 ᩍ⫱Ꮫ㒊
་Ꮫ㒊 ᕤᏛ㒊
ࠌ ࠌ ᛂ⏝⏕≀⛉Ꮫ㒊
ࠌ ࠌ 㐃ྜ⸆
࠙ᰗᡞタࠚ 㟁Ꮚࢫࣆࣥඹ㬆⨨
㸦JES-FA100࣭ESR㸧
࠙་Ꮫタࠚ 㟁Ꮚࢫࣆࣥඹ㬆⨨
㸦EMX Micro-6/1࣭ESR㸧
۔ᒣᐙ ග⏨
ἅỈ ⚈୍
ᒣෆ ு ᱓⏣ ୍ኵ
㸱㸮㸳㸰 㸰㸳㸵㸱 㸰㸷㸱㸮 㸴㸯㸲㸱
ᕤᏛ㒊 ࠌ ᛂ⏝⏕≀⛉Ꮫ㒊
㐃ྜ⸆
࠙ᰗᡞタࠚ
ㄏᑟ⤖ྜࣉࣛࢬ࣐Ⓨගศᯒ⨨
㸦ULTIMA2 ᇼሙ㸧
۔Ḉ⏣ ಟ ⢑㇂ ᚿ㑻 ᑠᮧ ㈼୍
ᐑᮏ Ꮫ ᑠᒣ ༤அ
ඵ௦⏣ ┿ே
㸰㸳㸵㸲 㸱㸮㸵㸱 㸰㸴㸮㸮 㸰㸳㸶㸶 㸰㸷㸯㸯 㸰㸶㸴㸵
ᕤᏛ㒊 ᆅᇦ⛉Ꮫ㒊
ᕤᏛ㒊 ࠌ ᛂ⏝⏕≀⛉Ꮫ㒊
ࠌ
࠙ᰗᡞタࠚ
㉮ᰝᆺࣉ࣮ࣟࣈ㢧ᚤ㙾ࢩࢫࢸ࣒
㸦SPI3800࣭SPM㸧
۔Ṋ㔝 ᫂⩏
▮ ㇏ ▼㯮 ு ᯇᮌ ఙ⾜
㸰㸴㸰㸷 㸰㸳㸶㸷 㸰㸴㸮㸵 㸰㸴㸷㸱
ᕤᏛ㒊 ࠌ ࠌ ࠌ
࠙ᰗᡞタࠚ
㉸㧗㏿ᗘ⌧㇟ゎᯒࢩࢫࢸ࣒
㸦UHC࣭HV࣭II࣭PG࣭TC㸧
۔㧗ᶫ ࿘ᖹ ᑿ ⱱᶞ ᐑᆏ Ṋᚿ
㸰㸳㸱㸷 㸰㸳㸰㸯 㸰㸳㸰㸱
ᕤᏛ㒊 ࠌ ࠌ
࠙ᰗᡞタࠚ
㛫ศゎ⺯ගศගගᗘィ⨨
㸦NAES-700㸧
࠙་Ꮫタࠚ
࣑ࣝࣀ࣓࣮ࢪࢼࣛࢨ࣮
㸦Fujifilm LAS-1000UVmini㸧
⺯ගศගගᗘィ 㸦ᓥὠ㸧
۔ᒣᐙ ග⏨
டᒣ ၨ୍
❑⏣ ⿱
᱓⏣ ୍ኵ
㸱㸮㸳㸰 㸰㸴㸮㸶 㸰㸳㸷㸴 㸴㸯㸲㸳
ᕤᏛ㒊 ࠌ ࠌ 㐃ྜ⸆
࠙ᰗᡞタࠚ ᑠᆺᶵჾ
㸦UV-Vis࣭FT-IR࣭ 㢧 ᚤ FT-IR࣭ReactIR࣭ IlluminatIR࣭CD࣭᪕ගᗘィ㸧
۔ἅỈ ⚈୍
బ⸨ ⠇Ꮚ
Ⰻ ⪷୍
▼㯮 ு Ⱚཎ ᩥ
ᰗ℩ ➗Ꮚ
㸰㸳㸵㸱 㸰㸰㸳㸲 㸴㸰㸱㸷 㸰㸴㸮㸵 㸰㸴㸯㸴 㸰㸷㸯㸲
ᕤᏛ㒊 ᩍ⫱Ꮫ㒊
་Ꮫ㒊 ᕤᏛ㒊
ࠌ ᛂ⏝⏕≀⛉Ꮫ㒊
࠙ᰗᡞタࠚ
᭷ᶵᚤ㔞ඖ⣲ศᯒ⨨
㸦CHNO㸧 㸦MT-6㸧
۔ྜྷᯇ ୕༤
ྂᒣ ᾈᏊ
⧴⧭ Ᏺ ᾏ⪁ཎᫀᘯ
⯪᭥ ୍ṇ ႐ከᮧᚨ
㸰㸰㸳㸯 㸴㸳㸮㸳 㸰㸴㸯㸷 㸰㸳㸵㸰 㸰㸳㸷㸷 㸰㸴㸲㸯
ᩍ⫱Ꮫ㒊
་Ꮫ㒊 ᕤᏛ㒊
ࠌ ࠌ ࠌ
࠙ᰗᡞタࠚ
㢧ᚤ࣮ࣞࢨ࣮࣐ࣛࣥศගࢩࢫࢸ࣒
㸦NRS-1000㸧
۔ஂ⡿ ᚭ
Ṋ㔝 ᫂⩏
⚄ཎ ಙᚿ
㸰㸴㸶㸯 㸰㸴㸰㸷 㸰㸳㸶㸯
ᕤᏛ㒊 ࠌ ࠌ
࠙ᰗᡞタࠚ
⇕ศᯒࢩࢫࢸ࣒
㸦DSC࣭TMA࣭TG-DTA㸧 㸦EXSTAR-6000㸧
࣓࣮ࣞ࢜ࢱ࣮㸦AR-Gϩ KG㸧
ືⓗ⢓ᙎᛶ ᐃ⨨㸦DMA Q800 KG㸧
۔ἅỈ ⚈୍
Ṋ㔝 ᫂⩏
Ḉ⏣ ಟ ᮌᮧ ᾈ ᐑᮏ Ꮫ すὠ ㈗ஂ
ᒾᮏ ᝅᚿ
㸰㸳㸵㸱 㸰㸴㸰㸷 㸰㸳㸵㸲 㸰㸴㸰㸰 㸰㸳㸶㸶 㸰㸶㸶㸶 㸰㸷㸰㸲
ᕤᏛ㒊 ࠌ ࠌ ࠌ ࠌ ᛂ⏝⏕≀⛉Ꮫ㒊
ࠌ
࠙ᰗᡞタࠚ
ࣇ࢙࣒ࢺ⛊ࣇࣂ࣮࣮ࣞࢨ࣮
㸦BS-60-YS㸧
ࢸࣛ࣊ࣝࢶศග㉮ᰝᆺ㢧ᚤ㙾
۔ྜྷ⏣ ᘯᶞ ᒣᐙ ග⏨
㸰㸵㸮㸴 㸱㸮㸳㸰
ᕤᏛ㒊 ࠌ
࠙ᰗᡞタࠚ
㸱ḟඖ≀㉁ᚤ⣽ᵓ㐀ゎᯒࢩࢫࢸ࣒
X⥺࣐ࢡࣟCTࢫ࢟ࣕࣥ㸦Skyscan1172㸧 ⢏Ꮚᚄ࣭⢏Ꮚᙧ≧ ᐃ⨨㸦FPIA㸫3000㸧 㸦ࢮ࣮ࢱࢧࢨ࣮ࢼࣀZS㸧 ࢹࢪࢱ࣐ࣝࢡࣟࢫࢥ࣮ࣉ
㸦ࣛ࢝ DVM㸫5000㸧
࠙་Ꮫタࠚ
⢏Ꮚᚄ࣭ศᏊ㔞 ᐃ⨨
㸦ࢮ࣮ࢱࢧࢨ࣮ࢼࣀ㸧
۔すὠ ㈗ஂ
Ṋ㔝 ᫂⩏
క 㝯ᖾ ᳜ᯇ ⨾ᙪ ྜྷ⏣ 㐨அ ᒾᮏ ᝅᚿ
୰㔝 ᾈᖹ ᱓⏣ ୍ኵ
㸰㸶㸶㸶 㸰㸴㸰㸷 㸰㸳㸶㸳 㸰㸳㸮㸯 㸰㸳㸴㸴 㸰㸷㸰㸲 㸰㸶㸷㸵 㸴㸯㸲㸳
ᛂ⏝⏕≀⛉Ꮫ㒊 ᕤᏛ㒊
ࠌ ࠌ ࠌ ᛂ⏝⏕≀⛉Ꮫ㒊
ࠌ 㐃ྜ⸆
࠙་Ꮫタࠚ X⥺⤖ᬗゎᯒ⨨
㸦FR-E Super Bright㸧
۔ᾏ⪁ཎᫀᘯ ᾏ⪁ཎ❶㑻
᱓⏣ ୍ኵ
㸰㸳㸵㸰 㸰㸷㸮㸵 㸴㸯㸲㸳
ᕤᏛ㒊 ᛂ⏝⏕≀⛉Ꮫ㒊
㐃ྜ⸆
ᯏེಽᨆಽ㊁දജຬߦ㑐ߔࠆ↳ߒวࠊߖ
㧔⿰ᣦ㧕
╙1 ߎߩ↳วߖߪޔጘ㒂ᄢቇ↢⑼ቇ✚ว⎇ⓥᡰេࡦ࠲㧔એਅޟࡦ࠲ޠߣ߁ޕ㧕ߦ⟎ߊޕ ᯏེಽᨆಽ㊁දജຬ㧔એਅޟදജຬޠߣ߁ޕ㧕ߦ㑐ߒޔᔅⷐߥ㗄ࠍቯࠆ⠪ߣߔࠆޕ
╙ 2 දജຬߪޔࡦ࠲ߩᯏེಽᨆಽ㊁߇ᚲߔࠆᯏེ߮⸳㧔એਅޟᯏེ╬ޠߣ߁ޕ㧕ࠍޔ
⽿છࠍ߽ߞߡขᛒ߁ߎߣ߇ߢ߈ࠆ⠪ߣߔࠆޕ
╙3 දജຬߪᯏེߏߣߦ⟎߈ޔࡦ࠲㐳߇ផ⮈ߔࠆጘ㒂ᄢቇߩኾછߩᢎຬࠍ߽ߞߡలߡޔቇ㐳߇
ᆔབྷߔࠆޕ
╙4 දജຬߩㆬߦࠃࠅᜂᒰߔࠆᯏེߏߣߩ⽿છ⠪㧔એਅޟ⽿છ⠪ޠߣ߁ޕ㧕ࠍㆬߔࠆޕ
╙5 දജຬߪޔࡦ࠲ߩᢎ⡯ຬߣදജߒߡᰴߩౝኈࠍද⼏ߒޔᬺോࠍⴕ߁ޕ
Ԙ ᯏེ╬ߩේℂ↪ᴺߦ㑐ߔࠆ⻠⠌ળ╬ߦ㑐ߔࠆߎߣޕ ԙ ᯏེ╬ߩ⛽ᜬ▤ℂߦ㑐ߔࠆߎߣޕ
Ԛ ᯏེ╬ߩ↪ᴺ╬⋧⺣ߦ㑐ߔࠆߎߣޕ
ԛ ߘߩઁޔᯏེ╬ߩṖߥㆇ↪ߦ㑐ߔࠆߎߣޕ
╙6 දജຬߩછᦼߪੑᐕߣߒޔౣછࠍᅹߍߥޕ
㸳
㸳 タ⨨ᶵჾ➼୍ぴ࠾ࡼࡧᶵჾࡢㄝ᫂
㸦ᰗᡞタ㸧
H23.4⌧ᅾ ရ ྡ ⣡ධᖺᗘ つ ᱁
1. ᆺ㟁Ꮚ㢧ᚤ㙾㸦TEM㸧
ᆺ㟁Ꮚ㢧ᚤ㙾㸦TEM㸧STEM,,EDX
࢞ࣛࢫࢼࣇస〇ჾ ࠌ
㉸࣑ࢡࣟࢺ࣮࣒
┿✵╔⨨
ࣇ࣮ࣜࢬࣞࣉࣜ࢝⨨
ᐇయ㢧ᚤ㙾 ࢜ࣥࢫࣃࢵࢱ
ࢿ࢜࢜ࢫ࣑࣒࢘ࢥ࣮ࢱ࣮
ࢹࣥࣉࣝࢢࣛࣥࢲ࣮
࣑࢜ࣥࣜࣥࢢ⨨
⢭ᐦ࣏࢜ࣥࣜࢵࢩࣥࢢ⨨
㉸㡢Ἴࢹࢫࢡ࢝ࢵࢱ࣮
ࢲࣖࣔࣥࢻ࣮࣡ࣖࢯ࣮
ࢫࣃࢵࢱࢥ࣮ࢱ࣮
࣮࢝࣎ࣥࢥ࣮ࢱ࣮
㉮ᰝᆺ㟁Ꮚ㢧ᚤ㙾 (FE-SEM) EDX ㉮ᰝᆺ㟁Ꮚ㢧ᚤ㙾 (N-SEM)
㧗ศゎ⬟㟁⏺ᨺฟᆺ㉮ᰝ㟁Ꮚ㢧ᚤ㙾(FE-SEM)
H21ᖺᗘ ࠌ S60ᖺᗘ
H9ᖺᗘ ࠌ S59ᖺᗘ S60ᖺᗘ H9ᖺᗘ H8ᖺᗘ H ᖺᗘ
H5ᖺᗘ H19ᖺᗘ H21ᖺᗘ H22ᖺᗘ
ࠌ ࠌ ࠌ H14ᖺᗘ H15ᖺᗘ H19ᖺᗘ
᪥❧ H-7000,
᪥ᮏ㟁Ꮚ JEM-2100
୕⛉Ꮫ࣓ࢵࢧ࣮C
ࣛ࢝ ࢞ࣛࢫࢼࣇ࣓࣮࣮࢝ EM KMR
ࣛ࢝ ULTRACUT-UCT
᪥❧ HUS-5GB
᪥❧ HFZ-1 ࢽࢥࣥ SMZ
᪥❧ E-102, E-201
┕ၟ NE-01044
࢞ࢱࣥ MODEL 656 N
᪥❧ E-3500ᙧ
࢞ࢱࣥ MODEL 601
࢞ࢱࣥ MODEL 601
࣓࣡ࣇ࢛࣮ࢩࢫ DWS3242
࣓࣡ࣇ࢛࣮ࢩࢫ SC200
࣓࣡ࣇ࢛࣮ࢩࢫ CADE-EHS
᪥❧ S-4300㸪ᇼሙ EMAX EX-220
᪥❧ S-3000N
᪥❧ S-4800
㸰㸬㉮ᰝᆺX⥺ග㟁Ꮚศගศᯒ⨨
H19ᖺᗘ ࣝࣂࢵࢡ࣭ࣇ Quantera SXM-GS
㸱㸬㧗ศゎ⬟㉁㔞ศᯒ⨨㸦MS㸧 ࠌ
ࠌ
H13ᖺᗘ H15ᖺᗘ
ࠌ
᪥ᮏ㟁Ꮚ GCmate
᪥ᮏ㟁Ꮚ JMS-700
᪥ᮏ㟁Ꮚ AMSUN200(K9)
㸲㸬ᾮయࢡ࣐ࣟࢺࢢࣛࣇ ᖹᡂ15ᖺᗘ Agilent1100 MS-52011LC
㸳㸬ࣇ࣮࢚ࣜኚ᰾☢Ẽඹ㬆⨨㸦FT-NMR㸧 ෆヂ㸸500 MHz
400 MHz 600 MHz
ᅛయ ᐃ⿵ຓ⨨(500 MHz)
H14ᖺᗘ H18ᖺᗘ
ࠌ ࠌ
᪥ᮏ㟁Ꮚ JNM ECA500 㸦500MHz㸧
᪥ᮏ㟁Ꮚ JNM ECX400P 㸦400MHz㸧
᪥ᮏ㟁Ꮚ JNM ECA600 㸦600MHz㸧
᪥ᮏ㟁Ꮚ ᅛయ ᐃ⿵ຓ⨨(500 MHz)
㸴㸬㟁Ꮚࢫࣆࣥඹ㬆⨨㸦ESR㸧 H14ᖺᗘ ᪥ᮏ㟁Ꮚ JES FA100
㸵㸬ㄏᑟ⤖ྜࣉࣛࢬ࣐Ⓨගศᯒ⨨㸦ICP-AES㸧 H20ᖺᗘ ᇼሙ JOVIN YBON ULTIMA2
㸶㸬㉮ᰝᆺࣉ࣮ࣟࣈ㢧ᚤ㙾ࢩࢫࢸ࣒㸦SPM㸧
H12ᖺᗘ ࢚ࢫ࣭࣭ SPI3800 ከᶵ⬟ᆺࣘࢽࢵࢺ SPA400
⎔ቃไᚚࣘࢽࢵࢺ SPA300V
㸷㸬㉸㧗㏿ᗘ⌧㇟ゎᯒࢩࢫࢸ࣒
ෆヂ㸸㉸㧗㏿ᗘᙳ⨨
ගቑᖜගᏛ⨨
㧗㏿ᗘࣅࢹ࢜⨨
ࣃࣝࢫࢪ࢙ࢿ࣮ࣞࢱ ⇕⏬ീゎᯒ⨨
PIVࢩࢫࢸ࣒
ࠌ ࠌ
㛫ศゎ⺯ගศගගᗘィ㸦NAES㸧
H10ᖺᗘ ࠌ ࠌ ࠌ ࠌ H15ᖺᗘ
ࠌ ࠌ H10ᖺᗘ
NAC FS501 NAC ILS NAC HS-4540-2 NAC DG-535 ࢽࢥࣥ LAIRD 3ASH
࢝ࣥࢸࣝ♫ TwinsUltra120 (࣮ࣞࢨ࣮)
࢜ࢵࢡࢫࣇ࢛࣮ࢻ࣮ࣞࢨ࣮♫
ES1.0-NI1422㸦࣓࢝ࣛ㸧
᪥ᮏ࣮ࣞࢨ࣮♫ VPP-2D㸦ࣉࣟࢭࢵࢧ㸧
ᇼሙ NAES-700D㸪ࢼࣀ⛊ࣛࣥࣉ㸪
❅⣲㸫Ⰽ⣲࣮ࣞࢨ࣮࡞
㸯㸮㸬 ⣸እྍどศගගᗘィ㸦UV-Vis㸧
ࣇ࣮࢚ࣜኚᆺ㉥እศගගᗘィ㸦FT-IR㸧
㏱㐣ᆺศගィ 㢧ᚤ࣭ᑕᆺศගィ
ࣉ࣮ࣟࣈᘧศගィ 㢧ᚤ࣭᥋ゐᆺศගィ ᪕ගᗘィ
H22ᖺᗘ
H22ᖺᗘ H14ᖺᗘ H15ᖺᗘ
ࠌ H22ᖺᗘ
ࣃ㸫࢚࣐࣮࢟ࣥࣝ ࣒ࣛࢲ950
ࣃ࣮࢚࣐࣮࢟ࣥࣝ Spectrum100
᪥ᮏศග 460Plus
⡿ᅜASI Applied Systems♫ ReactIR 400F-GU
⡿ᅜSensIR Technologies♫ IlluminatIR
᪥ᮏศග P-2300
㸯㸯㸬 Ⰽᛶศᩓィ㸦CD㸧
H13ᖺᗘ ᪥ᮏศග J-820P
㸯㸰㸬᭷ᶵᚤ㔞ඖ⣲ศᯒ⨨㸦CHNO㸧
࣮࢜ࢺࢧࣥࣉ࣮ࣛ
H12ᖺᗘ ࠌ
ࣖࢼࢥศᯒᕤᴗ MT-6
ࣖࢼࢥศᯒᕤᴗ MTA-620
㸯㸱㸬㢧ᚤ࣮ࣞࢨ࣮࣐ࣛࣥศගࢩࢫࢸ࣒ H14ᖺᗘ ᪥ᮏศග NRS-1000
㸯㸲㸬⇕ศᯒࢩࢫࢸ࣒ (DSC, TMA, TG/DTA)
࣓࣮ࣞ࢜ࢱ࣮㸦AR-Gϩ KG㸧
ືⓗ⢓ᙎᛶ ᐃ⨨㸦DMA Q800 KG㸧
H15ᖺᗘ H22ᖺᗘ
ࠌ
࢚ࢫ࣭࣭ EXSTAR6000
TA࣭ࣥࢫࢶ࣓ࣝࣥࢺ AR-G2 KG
TA࣭ࣥࢫࢶ࣓ࣝࣥࢺ DMA Q800 KG
㸯㸳㸬ࣇ࢙࣒ࢺ⛊ࣇࣂ㸫ࣞ㸫ࢨ㸫 ࢸࣛ࣊ࣝࢶศග㉮ᰝᆺ㢧ᚤ㙾
H17ᖺᗘ H19ᖺᗘ
ࢩࣥ⢭ᶵ ࣇ࢙࣒ࢺࣛࢺBS-60-YS
࢜ࢨ࣡ THz-TDS
㸯㸴㸬ࡑࡢ
㉸㡢ἼὙίჾ ┤♧ኳ⛗
H7ᖺᗘ ࠌ
BRANSONIC 220
࣓ࢺ࣮ࣛ AG245
㸯㸵. 㸱ḟඖ≀㉁ᚤ⣽ᵓ㐀ゎᯒࢩࢫࢸ࣒
H22ᖺᗘ ᮾὒࢸࢡࢽ࢝ SKYSCAN1172-GU
㸦
㸦་Ꮫタ㸧
H23.4⌧ᅾ
ရ ྡ ⣡ධᖺᗘ つ ᱁
1. ᰾☢Ẽඹ㬆ศග⨨㸦NMR㸧 ෆヂ㸸800MHz
600MHz 500MHz
H21ᖺᗘ ࠌ ࠌ
Bruker Biospin AVANCE III 800 Bruker Biospin AVANCE III 600 Bruker Biospin AVANCE III 500
㸰㸬㟁⏺ᨺᑕᆺ㏱㐣㟁Ꮚ㢧ᚤ㙾 H20ᖺᗘ JEOL JEM-2100FGK
㸱㸬㉸㧗㍤ᗘX⥺ᅇᢡ⨨ H17ᖺᗘ Rigaku FR-E SuperBright
㸲㸬㟁Ꮚࢫࣆࣥඹ㬆⨨㸦ESR㸧 H21ᖺᗘ Bruker Biospin EMXmicro
㸳㸬᭷ᶵྜ≀⮬ືศྲྀ⢭〇ࢩࢫࢸ࣒ (LC-MS) H18ᖺᗘ waters micromass ZQ
㸴㸬࣮ࣝࢳࣥ⏝ࢡࣜ࢜ࢫࢱࢵࢺ H21ᖺᗘ LEICA CM1850
㸵㸬࣑ࣝࣀ࣓࣮ࢪࢼࣛࢨ࣮ H18ᖺᗘ Fujifilm LAS-1000UVmini
㸶㸬⺯ගගᗘィ H17ᖺᗘ ᓥὠ RF-5300PC
㸷㸬⢏ᏊᚄศᏊ㔞 ᐃ⨨ H19ᖺᗘ Sysmex Zetasizer Nano-S
㸯㸮㸬࣌ࣉࢳࢻྜᡂ⨨ H18ᖺᗘ Protein Technologies, Inc. PS3
ᶵ
ᶵჾ㓄⨨ᅗᰗᡞタ
ᶵ ჾ ྡ ࣓࣮࣮࣭࢝ᆺ␒ ሙ ᡤ
㟁Ꮚࢫࣆࣥඹ㬆⨨ (ESR) ᪥ᮏ㟁Ꮚ JES-FA100 A ࢹࢪࢱ࣐ࣝࢡࣟࢫࢥ࣮ࣉ ࣐ࣛ࢝ࢡࣟࢩࢫࢸ࣒ࢬ DVM-5000 B
㉮ᰝᆺࣉ࣮ࣟࣈ㢧ᚤ㙾ࢩࢫࢸ࣒ (SPM) SII SPI3800N C
࢞ࣛࢫࢼࣇస〇ᶵ ୕⛉Ꮫ ࣓ࢵࢧ࣮C
ࣛ࢝ ࢞ࣛࢫࢼࣇ࣓࣮࣮࢝ EM D
㉸࣑ࢡࣟࢺ࣮࣒ ࣛ࢝ ULTRACUT-UCT
ᐇయ㢧ᚤ㙾 ࢽࢥࣥ SMZ
㢧ᚤ࣭᥋ゐᆺศගィ ࢭࣥࢧ࣮ࢸࢡࣀࣟࢪ࣮ࢬ Illuminat IR E
㏱㐣ᆺ㟁Ꮚ㢧ᚤ㙾 (TEM) ᪥ᮏ㟁Ꮚ JEM-2100 F
᪥❧ H-7000 G
㉮ᰝᆺ㟁Ꮚ㢧ᚤ㙾 (FE-SEM) ᪥❧ S-4300
࢚ࢿࣝࢠ࣮ศᩓᆺ X ⥺ศᯒ⨨ ᇼሙ EX-220 H
㧗ศゎ⬟㟁⏺ᨺฟᆺ㉮ᰝ㟁Ꮚ㢧ᚤ㙾 ᪥❧ S-4800 I
㉮ᰝᆺ㟁Ꮚ㢧ᚤ㙾 (N-SEM) ᪥❧ S-3000N J
ࢿ࢜࢜ࢫ࣑࣒࢘ࢥ࣮ࢱ࣮ ࣓࣡ࣇ࢛࣮ࢩࢫ NE-01044
K
࣑࢜ࣥࣜࣥࢢ⨨ ᪥❧ E-3500
ࢹࣥࣉࣝࢢࣛࣥࢲ࣮ ࢞ࢱࣥ MODEL 656N
⢭ᐦ࣏࢜ࣥࣜࢵࢩࣥࢢ⨨ ࢞ࢱࣥ MODEL 691
㉸㡢Ἴࢹࢫࢡ࢝ࢵࢱ࣮ ࢞ࢱࣥ MODEL 601 ࢲࣖࣔࣥࢻ࣮࣡ࣖࢯ࣮ ࣓࣡ࣇ࢛࣮ࢩࢫ DWS3242
࢜ࣥࢫࣃࢵࢱ࣮ ᪥❧ E-102, E-201 ࢫࣃࢵࢱࢥ࣮ࢱ࣮ ࣓࣡ࣇ࢛࣮ࢩࢫ SC200
࣮࢝࣎ࣥࢥ࣮ࢱ࣮ ࣓࣡ࣇ࢛࣮ࢩࢫ CADE-EHS
ࣇ࣮ࣜࢬࣞࣉࣜ࢝⨨ ᪥❧ HFZ-1
┿✵╔⨨ ᪥❧ HUS-5GB
᭷ᶵᚤ㔞ඖ⣲ศᯒ⨨ (CHNO) ࣖࢼࢥศᯒᕤᴗ CHNࢥ࣮ࢲ࣮ MT-6
࣮࢜ࢺࢧࣥࣉ࣮ࣛ MTA-620 L
㢧ᚤ࣮ࣞࢨ࣮࣐ࣛࣥศගࢩࢫࢸ࣒ ᪥ᮏศග NRS-1000 M
ࣉ࣮ࣟࣈᘧศගィ ASI Applied Systems ReactIR 4100F-GU N
㉁㔞ศᯒ⨨ (MS) ᪥ᮏ㟁Ꮚ GCmateϩ O
᪥ᮏ㟁Ꮚ JMS-AMSUN200 (K-9) P
᪥ᮏ㟁Ꮚ JMS-700 Q
ᾮయࢡ࣐ࣟࢺࢢࣛࣇ ࢪࣞࣥࢺ MS-52011LC R
ࣇ࣮࢚ࣜኚ᰾☢Ẽඹ㬆⨨ (FT-NMR) ᪥ᮏ㟁Ꮚ JMN ECA-500࣭ᅛయ S
᪥ᮏ㟁Ꮚ JMN ECX-400P T
᪥ᮏ㟁Ꮚ JMN ECA-600 U
PIV ᐃ⨨ ᪥ᮏ࣮ࣞࢨ࣮ Visi Vector
㉸㧗㏿ᗘᙳ⨨ NAC࣭FS501, ILS, HS-4540-2 V
⇕⏬ീゎᯒ⨨ ࢽࢥࣥ LAIRD 3ASH
⣸እྍどศගගᗘィ (UV-Vis) ࣃ㸫࢚࣐࣮࢟ࣥࣝ ࣒ࣛࢲ950 W 㢧ᚤࣇ࣮࢚ࣜኚ㉥እศගගᗘィ (㢧ᚤIR) ᪥ᮏศග 460Plus, IRT-30 X
ࣇ࣮࢚ࣜኚ㉥እศගගᗘィ (FT-IR) ࣃ࣮࢚࣐࣮࢟ࣥࣝ Spectrum100 Y
Ⰽᛶศᩓィ (CD) ᪥ᮏศග J-820P Z
㉮ᰝᆺ X ⥺ග㟁Ꮚศගศᯒ⨨ ࣝࣂࢵࢡ࣭ࣇ Quantera SXM-GS Z
᪕ගᗘィ ᪥ᮏศග P-2300 a
X⥺࣐ࢡࣟCTࢫ࢟ࣕࣥ SKYSCAN SKYSCAN1172-GU b ࢸࣛ࣊ࣝࢶศග㉮ᰝᆺ㢧ᚤ㙾 ࢜ࢨ࣡ THz-TDS
ࣇ࢙࣒ࢺ⛊ࣇࣂ࣮࣮ࣞࢨ࣮ ࢩࣥ⢭ᶵ ࣇ࢙࣒ࢺࣛࢺBS-60-YS d
ࣇ࣮ࣟᘧ⢏Ꮚീศᯒ⨨ ࣐ࣝࣂ࣮ࣥ FPIA-3000 e
⢏Ꮚᚄ࣭ࢮ࣮ࢱ㟁࣭ศᏊ㔞 ᐃ⨨ ࣐ࣝࣂ࣮ࣥ ࢮ࣮ࢱࢧࢨ࣮ࢼࣀZS f
ᶵ
ᶵჾ㓄⨨ᅗᰗᡞタ
ᶵ ჾ ྡ ࣓࣮࣮࣭࢝ᆺ␒ ሙ ᡤ
᰾☢Ẽඹ㬆ศග⨨㸦NMR㸧 Bruker Biospin AVANCE III 600 A
Bruker Biospin AVANCE III 800 B
㟁Ꮚࢫࣆࣥඹ㬆⨨㸦ESR㸧 Bruker Biospin EMXmicro C
㉸㧗㍤ᗘX⥺ᅇᢡ⨨ Rigaku FR-E SuperBright D 㟁⏺ᨺᑕᆺ㏱㐣㟁Ꮚ㢧ᚤ㙾 JEOL JEM-2100FGK E
࣮ࣝࢳࣥ⏝ࢡࣜ࢜ࢫࢱࢵࢺ LEICA CM1850 F
᭷ᶵྜ≀⮬ືศྲྀ⢭〇ࢩࢫࢸ࣒(LC-MS) waters micromass ZQ G
࣑ࣝࣀ࣓࣮ࢪࢼࣛࢨ࣮ Fujifilm LAS-1000UVmini H
⢏ᏊᚄศᏊ㔞 ᐃ⨨ Sysmex Zetasizer Nano-S I
࣌ࣉࢳࢻྜᡂ⨨ Protein Technologies, Inc. PS3 J
⺯ගගᗘィ ᓥὠ RF-5300PC K
᰾☢Ẽඹ㬆ศග⨨㸦NMR㸧 Bruker Biospin AVANCE III 500 L
L
5
ҔܖᢿᲲ᨞
G
I
J K H
F
Ҕܖᢿ᨞
E
D
ဃԡᅹܖᲫ᨞
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A
C
F G K
R
V A C
M
S
U T
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ೞ֥ЎௌܴᲫ ೞ֥ЎௌܴᲬ
ೞ֥ЎௌܴᲭ
Ճ᬴ܱܴ
ೞ֥ЎௌܴᲮ ೞ֥ЎௌܴᲯ
ʙѦܴ
Ў
ᧈ
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Ճ ᄂ ᆮ
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Z
d
k
ᆰᛦೞܴ
P Q
L
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ᶵ
ᶵჾศᯒศ㔝㸦ᰗᡞタ㸧ࡢෆ⥺␒ྕෆ
ศ㔝㛗ᐊ 㸦㏆Ụ㸧 2037
⫋ဨົᐊ㸦⋢ᕝ࣭ᮧ℩࣭ᮡᒣ㸧 2035 (FAX 2036)
ᶵჾศᯒᐊ㸯
㢧ᚤ࣮ࣞࢨ࣮࣐ࣛࣥศගࢩࢫࢸ࣒ 2035 MS, ඖ⣲ศᯒ
㉮ᰝ㟁Ꮚ㢧ᚤ㙾, 㟁㢧㛵㐃ᑠᆺᶵჾ
㏱㐣ᆺ㟁Ꮚ㢧ᚤ㙾 9571
ᶵჾศᯒᐊ㸰
AFM, 㟁㢧㛵㐃ᑠᆺᶵჾ, ESR 2035
ࢹࢪࢱ࣐ࣝࢡࣟࢫࢥ࣮ࣉ
ᶵჾศᯒᐊ㸱
FT-NMR᪥ᮏ㟁Ꮚ(500 MHz) 9572
ࠌ ᅛయ
ᶵჾศᯒᐊ㸲
FT-NMR᪥ᮏ㟁Ꮚ(400 MHz࣭600 MHz) 9570
ᶵჾศᯒᐊ㸳
CD, ESCA, FT-IR, 㢧ᚤFT-IR, 9573
UV-Vis, NAES, ㉸㧗㏿ᗘ⌧㇟ゎᯒࢩࢫࢸ࣒,
㉮ᰝᆺX⥺ග㟁Ꮚศගศᯒ⨨
ࣉ࣮ࣟࣈᘧศගィ, 㢧ᚤ࣭᥋ゐᆺศගィ, PIV ᐃ⨨, ICP(ᇼሙ)
⇕⏬ീゎᯒ⨨, ⇕ศᯒࢩࢫࢸ࣒
ࣇ࢙࣒ࢺ⛊ࣇࣂ࣮㢧ᚤ㙾 ࢸࣛ࣊ࣝࢶศග㉮ᰝᆺ㢧ᚤ㙾 X⥺࣐ࢡࣟCTࢫ࢟ࣕࣥ
⢏Ꮚᚄ࣭⢏Ꮚᙧ≧ ᐃࠖ⨨
⢏Ꮚᚄ࣭ࢮ࣮ࢱ㟁࣭ศᏊ㔞 ᐃ⨨
᪕ගᗘィࠊ࣓࣮ࣞ࢜ࢱ࣮ࠊືⓗ⢓ᙎᛶ ᐃ⨨
ᩍဨᐇ㦂ᐊ 3169
ᶵ
ᶵჾศᯒศ㔝㸦་Ꮫタ㸧ࡢෆ⥺␒ྕෆ
ᩍဨᒃᐊ㸦㙊㊊㸧 6151
ᩍဨᒃᐊ㸦≟ሯ㸧 6152
⫋ဨົᐊ㸦㔠᳃㸧 6603 (FAX 6603)
་Ꮫᮏ㤋7F 7N30 8263
᭷ᶵྜ≀⮬ືศྲྀ⢭〇ࢩࢫࢸ࣒(LC-MS) waters micromass ZQ
࣑ࣝࣀ࣓࣮ࢪࢼࣛࢨ࣮ Fujifilm LAS-1000UVmini
⺯ගගᗘィ ᓥὠ RF-5300PC
࣌ࣉࢳࢻྜᡂ⨨Protein Technologies, Inc. PS3
⢏ᏊᚄศᏊ㔞 ᐃ⨨ Sysmex Zetasizer Nano-S
་Ꮫᮏ㤋7F 7N16 8236
㟁⏺ᨺᑕᆺ㏱㐣㟁Ꮚ㢧ᚤ㙾 JEOL JEM-2100FGK
࣮ࣝࢳࣥ⏝ࢡࣜ࢜ࢫࢱࢵࢺLEICA CM1850
་Ꮫᮏ㤋8F 8S28 8266
᰾☢Ẽඹ㬆⨨ (NMR) Bruker Biospin AVANCE III 500
་Ꮫ⏕⛉ᏛᲷ 110 6602
᰾☢Ẽඹ㬆⨨ (NMR) Bruker Biospin AVANCE III 600
᰾☢Ẽඹ㬆⨨ (NMR) Bruker Biospin AVANCE III 800
་Ꮫ⏕⛉ᏛᲷ 111 6602
㟁Ꮚࢫࣆࣥඹ㬆⨨ (ESR) Bruker Biospin EMXmicro
་Ꮫ⏕⛉ᏛᲷ 114 8937
㉸㧗㍤ᗘX⥺ᅇᢡ⨨ Rigaku FR-E SuperBright
࠙
࠙ᰗᡞタࠚ 㸯㸬ᆺ㟁Ꮚ㢧ᚤ㙾
ᰗᡞタࡣࠊ㸰ྎࡢ㏱㐣ᆺ㟁Ꮚ㢧ᚤ㙾࠾ࡼࡧ㸱ྎࡢ㉮ᰝᆺ㟁Ꮚ㢧ᚤ㙾ࡀタ⨨ࡉࢀ࡚࠸ࡿࠋ
Ϩ㸧 ḟඖ㏱㐣ᆺ㟁Ꮚ㢧ᚤ㙾㸦7(0㸧᪥ᮏ㟁Ꮚ -(0ࠊ᪥❧ +㸦ᶵჾศᯒᐊ㸯㸧
ᙜศ㔝タ⨨ࡉࢀ࡚࠸ࡿ㟁Ꮚ㢧ᚤ㙾㸦᪥ᮏ㟁Ꮚ -(0ࠊ᪥❧ +㸧ࡣࠊ㧗ศゎ⬟ほᐹࠊ㟁Ꮚ
⥺ᅇᢡࠊࣇ࣒ࣝࢆ⏝࠸ࡎ &&' ࣓࢝ࣛീࡀᙳ㸦ࣇ࣒࡛ࣝࡢほᐹྍ⬟㸧ࢆ⾜࠺ࡇࡀฟ᮶ࡿࠋ
᪥ᮏ㟁Ꮚ -(0 ࡣࠊ67(0 ࡼࡿほᐹࠊ('; ࡼࡿඖ⣲ศᯒࠊᑐ㇟ࢆ㸱ḟඖ࡛ほᐹ࡛ࡁࡿ㸱' ࢺࣔ
ࢢࣛࣇࡶྍ⬟࡛࠶ࡿࠋࡲࡓࠊศゎ⬟ࡶ㧗ࡃࠊ67(0 ീࡶ &&' ࡛ᙳྍ⬟࡛࠶ࡾࠊ('; ࡛ࡣ࣍࢘⣲ࡼࡾ㔜
࠸ඖ⣲࡞ࡽศᯒྍ⬟࡛࠶ࡿࠋ་Ꮫ࣭⏕≀⛉Ꮫ࠾ࡼࡧᮦᩱ⛉Ꮫ࠾ࡅࡿヨᩱࡢ⥲ྜⓗศᯒࡀྍ⬟࡞ࡗ
࡚࠾ࡾࠊୗグࡢࡼ࠺࡞ศᯒࡀ᪥ᖖⓗ⾜ࢃࢀ࡚࠸ࡿࠋ 㸯㸧㏱㐣ീほᐹ7(0 㸦ᶵჾศᯒᐊ㸯㸧
⏕≀ᮦᩱ࠾ࡼࡧ㠀⏕≀ᮦᩱࡢ㉸ⷧษ∦ࢆ ಸࡽ ಸᣑࡋࠊෆ㒊ࡢᚤ⣽ᵓ㐀ࢆほᐹࡍࡿ
ࡇࡀ࡛ࡁࡿࠋศゎ⬟ࡣࠊύ㸦᱁Ꮚീ㸧ࡽ ύ㸦Ⅼほᐹീ㸧࡛࠶ࡿࠋຍ㏿㟁ᅽࡣ N9
ࡲ࡛ᣲࡆࡿࡇࡀฟ᮶ࠊ࠸ࢁ࠸ࢁ࡞✀㢮ࡢヨᩱࡀ⏝ྍ⬟࡛࠶ࡿࠋ㏱㐣ᆺ㟁Ꮚ㢧ᚤ㙾ࡣ㟁Ꮚࢆ㏱㐣ࡋ
࡚ほᐹࡍࡿ⨨࡛࠶ࡿࡽࠊ㟁Ꮚࡀ㏱㐣ࡍࡿࡃࡽ࠸ࡢཌࡉࡲ࡛ヨᩱࢆⷧࡃࡍࡿࡇࡀ๓ฎ⌮ࡋ࡚㔜 せ࡛࠶ࡿࠋࡇࡢ๓ฎ⌮⏝ࡢタഛࡶഛ࠼࡚࠸ࡿࠋࡲࡓࠊヨᩱࡢほᐹࡣ⺯ගᯈୖᢞᙳࡉࢀࡓീࢆぢ࡚⾜
࠸ࠊグ㘓ࡋࡓ࠸ീࡣ┿ࣇ࣒࡛ࣝᙳࡍࡿࠋᙳࡋࡓᚋࡣ⌧ീ࣭ᐃ╔➼࠾ࡇ࡞࠸ࠊࢿ࢞ࣇ࣒ࣝࢆ
ᚓࡿࠋࡇࢀࡽࡢ᧯సࡣⱝᖸࡢ⇍⦎ࢆせࡍࡿࠋ⏕≀ᮦᩱࡢሙྜࡣࠊ㏻ᖖࠊษ∦ࢆ✀ࠎࡢ㔠ᒓ࡛ᰁⰍ ࡋ࡚ほᐹࡍࡿࡀࠊᰁⰍ᧯సࢆ㑊ࡅࡓ࠸ሙྜࡣࠊ㉮ᰝ㏱㐣ീ67(0ᶵ⬟ࡼࡾࠊ↓ᰁⰍࡢษ∦ࢆ᫂ど㔝
ീࡋ࡚ほᐹࡍࡿࡇࡶ࡛ࡁࡿࠋࡲࡓࠊഴᩳゅᗘࢆኚ࠼ࡿࡇࡼࡾࠊ‽㉸ⷧษ∦ࡽࢫࢸࣞ࢜㟁Ꮚ 㢧ᚤ㙾┿ࢆస〇ࡍࡿࡇࡶྍ⬟࡛࠶ࡿࠋࡉࡽ⏕ࡁࡓ⣽⬊ࡢෆ㒊ᵓ㐀ࢆㄪࡿࡓࡵࡢࣇ࣮ࣜࢬ࢚ࢵ
ࢳࣥࢢࡸ⏕య⭷ࡢෆ㒊ᵓ㐀ࢆㄪࡿࡓࡵࡢࣇ࣮ࣜࢬࣇࣛࢡࢳ࣮ࣕࡶྍ⬟࡛࠶ࡿࠋษ∦స〇ࡢࡓࡵࡢ㉸
࣑ࢡࣟࢺ࣮࣒㸦ᶵჾศᯒᐊ㸰㸧࠾ࡼࡧ┿✵╔⨨㸦ᶵჾศᯒᐊ㸯㸧ࡶศ㔝タ⨨ࡋ࡚࠶ࡿࠋ 7(0 ࡛ྍ⬟࡞ほᐹ᪉ἲࡣࠊ㏻ᖖࡢ᫂ど㔝ീࠊヨᩱࡼࡗ࡚ᩓࡉࢀࡓ㟁Ꮚ⥺ࡢࡳࢆ⤖ീࡉࡏࡿᬯ
᪥❧H-7000
᪥ᮏ㟁ᏊJEM-2100
!!"#$%!!!&'()*
+,-./&'()*
㸰
㸰㸧; ⥺ศᯒ(';㸦ᶵჾศᯒᐊ㸯㸧
ヨᩱ㟁Ꮚࣅ࣮࣒ࢆᙜ࡚ࡿࠊヨᩱ୰ࡢඖ⣲ࡽ≉ᛶ㹖⥺ࡀᨺฟࡉࢀࡿࠋࡇࡢ㹖⥺ࡢ࢚ࢿࣝࢠ࣮ࢆ
ࢩࣜࢥ᳨ࣥฟჾ࡛ศගࡋࠊࢫ࣌ࢡࢺࣝࢆᚓࡿࡇ࡛ྵࡲࢀࡿඖ⣲ࡢศᯒࢆ⾜࠺ࡇࡀ࡛ࡁࡿࠋ67(0
ീࠊ7(0 ീࢆほᐹࡋ࡞ࡀࡽᕼᮃࡢ㒊㟁Ꮚ⥺ࢆ⤠ࡗ࡚↷ᑕࡋࠊࡑࡢ㒊ࡢⅬศᯒࢆ⾜ࡗࡓࡾࠊ⤠ࡗ ࡓ㟁Ꮚ⥺࡛ヨᩱࢆ㉮ᰝࡋ࡚㠃ศᯒࢆ⾜࠺ࡇࡀ࡛ࡁࡿࠋࡲࡓࠊࣇ࣒ࣝୖ 67(0 ീࠊඖ⣲ࡢศᕸ
ࢆ㔜ࡡྜࢃࡏࡿ࡞࠸ࢁ࠸ࢁ࡞⾲⌧᪉ἲࡀྍ⬟࡛࠶ࡿࠋ
㸱㸧ࢹࣥࣉࣝࢢࣛࣥࢲ࣮㸦*DWDQ0RGHO㸧 㸦ᶵჾศᯒᐊ㸯㸧
ࢭ࣑ࣛࢵࢡࢫࠊ༙ᑟయ࡞ࡢ㏱㐣㟁Ꮚ㢧ᚤ㙾ほᐹ⏝ࡢⷧ∦ヨᩱసᡂࡢࡓࡵ⏝࠸ࡿࠋヨᩱ⾲㠃ࢆࢲ
ࣔࣥࢻ࣮࣌ࢫࢺ࠶ࡿ࠸ࡣ࣑ࣝࢼ࣮࣌ࢫࢺ࡛◊☻ࡋࠊ⌫㠃≧ࡢ❑ࡳࢆసᡂࡍࡿࡇࡀ࡛ࡁࡿࠋ
ࡋ࡚ḟ㡯࡛㏙ࡿ࣑࢜ࣥࣜࣥࢢฎ⌮ࡢ๓ฎ⌮⏝࠸ࡿࠋ㏻ᖖࠊ᭱ᑠཌࡉ㒊ศࡀ ȣP㹼ȣP
ࡲ࡛◊☻ࡀྍ⬟࡛࠶ࡿࡀࠊὀព῝࠸᧯సࡼࡾ ȣP ࡲ࡛ⷧࡃࡍࡿࡇࡀྍ⬟࡛࠶ࡿࠋ
㸲㸧࣑࢜ࣥࣜࣥࢢ⨨㸦*DWDQ3,36㸧 㸦ᶵჾศᯒᐊ㸯㸧
ࡋ࡚ࢭ࣑ࣛࢵࢡࢫࠊ༙ᑟయ࡞ࡢ㏱㐣㟁Ꮚ㢧ᚤ㙾ほᐹ⏝ヨᩱࡢసᡂࡢ᭱⤊ฎ⌮⏝࠸ࡽࢀࡿࠋ
࠶ࡽࡌࡵᩘ༑ȣP ௨ୗࡢཌࡉࡋࡓヨᩱ⾲㠃ࠊ㧗┿✵୰࡛ຍ㏿ࡉࢀࡓࣝࢦࣥ࢜ࣥࢆ↷ᑕࡋࠊ ヨᩱ✰ࢆ㛤ࡅࡿࠋࡇࡢࠊ࢜ࣥࣅ࣮࣒ࢆ࠶ࡿゅᗘ࡛↷ᑕࡍࡿࠊ✰ࡢ࢚ࢵࢪ㒊ศࡀᩘ༑㹼ᩘⓒ
QP ࡢཌࡉ࡞ࡾࠊ㏱㐣㟁Ꮚ㢧ᚤ㙾ほᐹࡀྍ⬟࡞ࡿࠋᙜศ㔝タ⨨ࡉࢀ࡚࠸ࡿ *DWDQ3,36 ࡣྠ
ຍᕤ࡛ࡁࡿヨᩱᩘࡣ㸯ಶ࡛࠶ࡿࡀࠊຍᕤࢫࣆ࣮ࢻࡀⴭࡋࡃྥୖࡋࡓࠋ㓟≀ࡢヨᩱ࡛ࡶᩘ㛫࡛
TEMࡼࡿほᐹࡀྍ⬟࡞≧ែ࡛࠶ࡿࠋ
!"#$%&%'(
)*+,-./0/12%34
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ϩ㸧㉮ᰝᆺ㟁Ꮚ㢧ᚤ㙾㸦6(0㸧᪥❧ 6㸪61㸪6㸪( 㸦ᶵჾศᯒᐊ㸯㸧
ᙜศ㔝タ⨨ࡋ࡚࠶ࡿ㉮ᰝᆺ㟁Ꮚ㢧ᚤ㙾ࡣࠊ᪥❧〇సᡤ〇 6ࠊ6 ࠾ࡼࡧ 61 ࡛࠶ࡿࠋ 6 ࡣࠊ㟁⏺ᨺฟᆺ㟁Ꮚ㖠)(*ࢆഛ࠼ࡓ⨨࡛࠶ࡾࠊ㧗㍤ᗘ࣭㧗ศゎ⬟ほᐹࡀྍ⬟࡛ࠊ('; ࡼ
ࡿඖ⣲ศᯒࡶྍ⬟࡞ᶵ✀࡛࠶ࡿࠋ61 ࡣࠊ(6(' ࡸᑕ㟁Ꮚ᳨ฟჾࢆഛ࠼࡚࠾ࡾࠊ3D ࡢప┿
✵ᗘ࡛ࡢほᐹࡸ↓╔ほᐹࡀ࡛ࡁࡿᶵ✀࡛࠶ࡿࠋ
㟁⏺ᨺฟᆺ㟁Ꮚ㢧ᚤ㙾 6 㸦ᶵჾศᯒᐊ㸯㸧
ࡇࡢ㟁Ꮚ㢧ᚤ㙾ࡣ෭㝜ᴟ㟁⏺ᨺฟᆺ㟁Ꮚ㖠ࢆഛ࠼ࡓ⨨࡛࠶ࡾࠊຍ㏿㟁ᅽࡀ0.5㹼30 kVࡢ⠊ᅖ࡛
ྍኚྍ⬟࡛࠶ࡾࠊಸ⋡ࡀ20㹼500,000ಸࠊศゎ⬟ࡀ1.5 nm㸦15 kV㸧࠾ࡼࡧ5.0 nm㸦1 kV㸧࡛࠶ࡿࠋ 㧗㍤ᗘ㟁Ꮚ㖠࡛࠶ࡾࠊపຍ㏿㟁ᅽ࠼ࡤ1 kV࡛ࡶ㧗ศゎീࢆᚓࡿࡇࡀྍ⬟࡛࠶ࡿࠋࡲࡓపຍ㏿㟁 ᅽ࡛ࡣࠊ↓╔ほᐹ࡛ࡁࡿヨᩱࡶ࠶ࡿࠋࡉࡽഛࡉࢀ࡚࠸ࡿEDXࡣⅣ⣲ࡽࡢศᯒࡀྍ⬟࡞ࢱ
ࣉ࡛࠶ࡾࠊᐃᛶ࣭ᐃ㔞ศᯒࡣࡶࡕࢁࢇࠊ⏬ീࢆࣃࢯࢥࣥྲྀࡾ㎸ࢇ࡛⤌ᡂീࡢྜᡂࡶྍ⬟࡛࠶ࡿࠋ ࡇࡢSEMࡣࡍ࡚ࣃࢯࢥ࡛ࣥไᚚ࡛ࡁࡿࢱࣉ࡛࠶ࡾࠊᙳࡋࡓീࡶࢹࢪࢱࣝሗࡋ࡚ᚓࡽࢀࡿࠋ
᧯సୖὀពࡍࡁⅬࡣࠊEDX ࡢ㹖⥺ྲྀࡾ㎸ࡳ❆ࡀ㠀ᖖⷧࡃࠊᚤ⢏Ꮚ࡛ࡉ࠼ᐜ᫆◚ᦆࡢཎᅉ࡞
ࡿࡇ࡛࠶ࡾࠊヨᩱࢆᮏయᤄධࡍࡿ๓ࡣ࢚࣮ࣈ࣮࣮࡛ࣟ࣡ᚤ⢏Ꮚࢆྲྀࡾ㝖ࡃࡇࢆບ⾜ࡍࡿࠋ
ࡲࡓࠊ㟁Ꮚ㖠㏆ഐࡣ㠀ᖖ㧗࠸┿✵ᗘಖࡘᚲせࡀ࠶ࡾࠊヨᩱࡶ๓ࡶࡗ࡚༑ศ⬺Ẽࡍࡿᚲせࡀ࠶ࡿࠋ
ప┿✵㟁Ꮚ㢧ᚤ㙾 61 㸦ᶵჾศᯒᐊ㸯㸧
ࡇࡢ㟁Ꮚ㢧ᚤ㙾ࡣ㏻ᖖࡢࢱࣥࢢࢫࢸࣥ࣊ࣆࣥࣇ࣓ࣛࣥࢺࢆഛ࠼ࡓ⨨࡛࠶ࡾࠊຍ㏿㟁ᅽࡀ0.3 㹼30 kVࡢ⠊ᅖ࡛ྍኚྍ⬟࡛ࠊಸ⋡ࡀ5㹼300,000ಸࠊḟ㟁Ꮚീศゎ⬟ࡣ3.0 nm(㧗┿✵࣮ࣔࢻࠊ
ຍ㏿㟁ᅽ25 kV)ࠊᑕ㟁Ꮚീศゎ⬟ࡣ4.0 nm(ప┿✵࣮ࣔࢻࠊຍ㏿㟁ᅽ25 kV)࡛࠶ࡿࠋࡇࡢ㟁Ꮚ㢧
ᚤ㙾ࡢ≉ᚩࡣࠊప┿✵270 Pa㸦⣙2 torr㸧࡛ヨᩱࡢほᐹࡀྍ⬟࡞ࡇ࡛࠶ࡿࠋྵỈ㔞ࡀᑡ࡞࠸ヨᩱ
࡛ࡣࠊࡑࡢࡲࡲヨᩱᐊධࢀ࡚↓╔࡛ࡢほᐹࡀྍ⬟࡛࠶ࡿࠋࡇࡢほᐹࡣ͆⎔ቃSED, ESED͇ࡲ
ࡓࡣᑕ㟁Ꮚ⥺᳨ฟჾࢆ⏝࠸ࡿࠋ⏕యヨᩱࡣࡶࡕࢁࢇࠊ࣏࣐࣮ࣜࡸ㏻ᖖࡢ≧ែ࡛ࡣࢳ࣮ࣕࢪࢵࣉࡀ
⏒ࡔࡋ࠸ࡶࡢࡢほᐹࢆᚓពࡋ࡚࠸ࡿࠋࡲࡓヨᩱᐊࡶࡁࡃࠊほᐹ⠊ᅖࡣ2x6 cmᗈ࠸ࠋࡉࡽࣃ
ࢯࢥࣥࡼࡿ⮬ືࡀ㐍ࢇ࡛࠾ࡾࠊึᚰ⪅࡛ࡶᐜ᫆㩭᫂࡞⏬ീࢆᚓࡿࡇࡀྍ⬟࡛࠶ࡿࠋࡲࡓࠊࡇ ࡢ㟁Ꮚ㢧ᚤ㙾ࡣ㧗┿✵࡛ࡣᬑ㏻ࡢࢱࣥࢢࢫࢸࣥࣇ࣓ࣛࣥࢺࡢ㟁Ꮚ㢧ᚤ㙾ࡋ࡚ࡶ༑ศ࡞⬟ຊࡀ࠶
ࡿࠋ㏻ᖖࡢࢱࣥࢢࢫࢸࣥࣇ࣓ࣛࣥࢺᚲせ࡞㣬Ⅼࡢ᳨ฟࡸࣂࢫ࡞ࡶࡍ࡚⮬ືࡉࢀ࡚࠸
!
"#$
㟁㟁⏺ᨺฟᆺ㟁Ꮚ㢧ᚤ㙾 6 㸦ᶵჾศᯒᐊ㸯㸧
ࡇࡢ㟁⏺ᨺฟᆺ㟁Ꮚ㢧ᚤ㙾ࡣࠊS-4300ࡼࡾᛶ⬟࠸ᡭࡀྥୖࡋࡓ⨨࡛࠶ࡾࠊ௨ୗࡇࡢ
⨨ࡢ≉ᚩࢆ♧ࡍࠋ
1. 15 kV࡛1.0 nmࠊ1 kV࡛ࡶ2 nm㸦ࣜࢱ࣮ࢹࣥࢢᶵ⬟ࢆ࠺1.4 nm㸧ࡢ㧗ศゎ⬟
2. ಙྕ᳨ฟჾࡀᑐ≀ࣞࣥࢬࡢୖୗྛ୍ಶ᭷ࡾࠊ2ḟ㟁Ꮚ⥺ࡸᑕ㟁Ꮚ⥺ࡢಙྕࡢ⤌ྜࡏࡀྍ⬟
3. ヨᩱࡢฟࡋධࢀࡀ࣎ࢱࣥࢫࢵࢳ㸦ࣞࣂ࣮ࢆ᧯సࡍࡿᚲせࡀ࡞࠸㸧 4. ヨᩱࡢX-Y⛣ື࠾ࡼࡧᅇ㌿ࡢ3㍈ࡀ㟁ື
ࡇࢀࡽࡢ≉ᚩࢆ⏝ࡍࡿࡇ࡛ࠊ㠀ᖖⰋ࠸⏬ീࢆᙳྍ⬟࡛࠶ࡿࠋ࠼ࡤࠊ᳨ฟჾࡸ 2 ḟ㟁Ꮚ
⥺ᑕ㟁Ꮚ⥺ࢆ㑅ᢥࡍࡿࡇ࡛ࠊ࢚ࢵࢪຠᯝࡀࢇ↓࠸ീࢆᚓࡿࡇࡀฟ᮶ࡿࠋࣜࢱ࣮ࢹࣥ
ࢢᶵ⬟ࢆ࠼ࡤศゎ⬟ࡀ㧗ࡃ࡞ࡿࡔࡅ࡛࡞ࡃࠊ㧗㟁ᅽ࡛ࡢ㟁Ꮚ⥺↷ᑕ࡛ၥ㢟࡞ࡿヨᩱࡢࢲ࣓࣮ࢪࡶ
ᖜ㍍ῶ࡛ࡁࡿࠋࡲࡓࠊヨᩱᐊࡣࢱ࣮࣎ศᏊ࣏ࣥࣉ࡛Ẽࡋ࡚࠾ࡾࠊᾮయ❅⣲ࡢࣥࢳࢥࣥࢱ࣑ࢿ
࣮ࢩࣙࣥࢺࣛࢵࣉࢆే⏝ࡋ࡚Ύί࡞㞺ᅖẼ࡛ほᐹࡀฟ᮶ࡿࠋヨᩱྎࡣ 4 mmȭ ࡢࢿࢪ࡛ࢭࢵࢺ࡛ࡁ
ࡿࡀࠊ࣮࣡࢟ࣥࢢࢹࢫࢱࣥࢫࡀᑠࡉࡃࠊ⫼ࡢ㧗࠸ヨᩱࡣほᐹ࡛ࡁ࡞࠸ࡇࡶ࠶ࡿࠋ
ࣝࢦ࣑ࣥ࢜ࣥࣜࣥࢢ⨨ ( 㸦ᶵჾศᯒᐊ㸯㸧
ࡇࡢ࣑࢜ࣥࣜࣥࢢ⨨ࡣࠊ࢜ࣥ࢞ࣥ୰࡛ࣝࢦࣥ࢞ࢫࢆᨺ㟁࣭࢜ࣥࡋࠊ㧗㟁ᅽࢆ༳ຍࡋ࡚
࢜ࣥࢆᘬࡁฟࡋ࡚ヨᩱ⾪✺ࡉࡏࠊ◊☻ࡍࡿ⨨࡛࠶ࡿࠋヨᩱࡢ୍㒊ࡣ㐽ⶸᯈ࡛ಖㆤࡋࠊࡇࡢ㐽ⶸ ᯈࡼࡗ࡚ࡁࢀ࠸࡞᩿㠃ࡢᙧᡂࡀྍ⬟࡞ࡿࠋࡲࡓࠊ◊☻㏿ᗘࡶࠊ࢞ࣛࢫࡸࢩࣜࢥࣥ࡞࡛ࡣ 1 㛫100 Pmࠊ࢜ࣥࢩࢽࣥࢢ⨨ࡼࡾ᱁ẁࡁ࠸࣑ࣜࣥࢢ࣮ࣞࢺࡀᚓࡽࢀࡿࠋࡲࡓࠊ◊☻ࡉ
ࢀࡓ㠃ࡣ㠀ᖖᖹ࡛࠶ࡿࠋ
1. Electron Microscope
There are two types of microscope in the Center, i.e., two transmission electron microscopes (TEM) and three scanning electron microscopes (SEM).
Ϩ
Ϩ Transmission Electron Microscopy (TEM) (Room 1)
The transmission electron microscope (TEM) allows the investigation of the internal microstructure of organic samples as well as the inorganic, provided that they are thin enough to transmit electrons. The microscope is equipped with an X-ray detector made of Si semiconductor and energy dispersive spectrometer.
The set (energy disparsive X-ray spectrometer, EDX) enables us to analyze a chemical composition.
1) Transmission Electron Microscopy (TEM) (JEOL JEM-2100, Hitachi H-7000, Room 1)
We can observe ultra-thin-sections of biological specimens, ceramics, semiconductors, and metals using the TEM. The maximum resolution of the TEM was 0.144 nm (lattice image) and 0.021 nm (structure image) with magnification up to 1,000,000. Although an ordinal operation voltage of the JEM-2100 and H-7000 are 200 kV and 100kV, respectively, lower voltages are also available. Since the sample have to be thin enough, there are various instruments to make the specimen thin. The observation is conducted by adjusting an image on the fluorescent viewing screen and by recording the image on a negative film. The film has to be developed, fixed, and sometimes printed. The whole operation needs some technical skills. The biological specimens are usually observed after being stained with various metal solutions. However, the JEM-2100 can observe a bright field image of non-stained specimens with a scanning-transmission (STEM) mode. It is also possible to make a stereo pair of photographs by changing the tilt angle of semi-ultrathin sections. The ultramicrotome (in Room 2) and equipment for freeze-etching and freeze-fracture techniques are also available in the Center.
Bright field images, dark field images, which used the scattered electron beam for imaging, and the scanning-transmission images are available. When the specimen is crystalline, the Bragg reflection makes another type of image, an electron diffraction image, which can be used for determination of the crystal and an orientation of the crystal. The JEM-2100 and H-7000 have a computer-controlled lens that provides the best correlation of selected area image and diffraction pattern for all magnifications.
2) Energy Dispersive X-ray Analyzer (EDX) (Room 1)
An elemental microanalysis can be achieved by detecting a specific X-ray energy emitted from specimens on application of the electron beam. Point analyses can be carried out by viewing the S(T)EM or TEM image of the specimens and radiated the electron beam to the point of interest. Area scan mode is also available.
Various kinds of expression for data imaging are possible with this system, for example, the STEM image can be recorded simultaneously with an elemental mapping.
3) Dimple Grinder (GATAN Model 656/3) (Room 1)
A dimple grinder is an instrument used for grinding circular dimple of spherical profile in the surface of materials such as ceramics and semiconductors. The fundamental application is to prepare the specimens for TEM observation. This technique is normally used for pretreatment of ion milling. The operator can carefully produce a specimen with the thickness less than 5 μm. However, in most cases, a final thickness between 20
4) Ion Milling (GATAN PIPS-691) (Room 1)
The PIPS-691 is a machine which can “mill” the specimens such as ceramics and semiconductors for TEM observation. Ion milling involves directing a several-keV beam of argon ions at both sides of a specimen. As the ions strike the specimen, the surface atoms are sputtered out, which leads to thin the specimen.
ϩ Scanning Electron Microscopy (SEM) (Room 1)
In the center, there are two SEMs, type S-4300 and S–3000N. The former has a field emission type cold gun.
This type of the gun enables a bright and high-resolution image. The elemental analyzer, EDX, is also equipped. The latter type of the SEM is used for low-vacuum observation. The SEM can be operate as low vacuum as 270 Pa (about 2 torr) by an “environmental secondary electron detector, ESED” and/or a back scattering electron detector. This SEM can observe an insulating material without any conductive coating.
1) Scanning Electron Microscopy (SEM) (Hitachi, S-4300, Room 1)
The surface of tissues, cells, bacteria, viruses, and non-biological materials can be observed. The resolution is 1.5 nm (accelerate voltage; 25 kV) and 5.0 nm (1 kV). The electron beam is emitted from a field emission cold gun and a clear image can be obtained even the accelerate voltage is low, such as 1 kV. Some insulating specimen can be observed without any conductive coating. The SEM is equipped with EDX analyzer. This EDX can detect the characteristic X-ray from the so light elements such as carbon. The qualitative and quantitative analysis, a color mapping image of any element, digital files of all images and spectrum are available. The EDX, however, has very thin and delicate X-ray window and any dusts of micrometer size have to be avoided, otherwise the hit of the small particle causes fatal damage for the EDX. The instrument is controllable via PC and this brings an easy operation as a PC-SEM. The specimen has to be de-gassed before an introduction into the chamber. For the sample preparation of insulating materials, a critical point drying apparatus (in Room 5) and a conductive coating apparatus (in Room 5) are available in the Center.
2) Scanning Electron Microscopy (SEM) (S-3000N, Room 1)
This type of SEM has an ordinal tungsten hairpin type filament and can operate with accelerate voltage ranged 0.3 to 30 kV. Resolutions of the SEM are 3.0 nm (high vacuum mode, 25 kV) and 4.0 nm (low vacuum mode, 25 kV). An advantage of the SEM consists of an ability of low vacuum operation. The special type of the secondary electron detector, “Environmental SED”, can detect the secondary electron images even at low vacuum of 270 Pa (about 2 torr). Consequently, insulating samples and samples easily destroyed in vacuum are targets of the SEM. Further the specimen chamber is wide and the observation area is 4 x 6 cm size. When the SEM is operated under high vacuum, the SEM can be regarded as a high performance SEM with ordinal W filament. The SEM is a PC-SEM and easy operation is capable.
3) Scanning Electron Microscopy (SEM) , (S-4800, Room 1)
A new scanning electron microscope (SEM), Hitachi type S-4800, is introduced to the Division of Instrumental Analysis in 2008. The type S-4800 SEM has a field emission gun with the highest resolution of 1.0 nm at acceleration voltage of 15 kV. By using Beam Deceleration Technology, it has a resolution of 1.4 nm even at very low acceleration voltage of 1 kV. This also brings less damaged image with high resolution. The
specimen size is 100 mm. The working distance is usually 8 mm and tall specimen should be avoided.
4) Ion milling system, (E-3500, Room 1)
In order to prepare a cross-section of very thin area for SEM observation, a new ion milling apparatus, Hitachi E-3500, is now available. The E-3500 makes "mirror finished" cross-section by Ar ion bombardment with a shielding plate. The milling rate is about 100 m/h or more. Rounding of the edge, distortion and micro-cracking during machining and polishing of cross-section can be removed and clear-cut cross section can be obtained.
㸰
㸰㸬ᮦᩱ㟁Ꮚ≧ែゎᯒ⨨㸸; ⥺ග㟁Ꮚศᯒ⨨㸦(6&$;36㸧
ᙜศ㔝ࡣࣝࣂࢵࢡ࣭ࣇQuantera-SXM-GS ࡢ⾲㠃ศᯒ⨨ࡀタ⨨ࡉࢀ࡚࠸ࡿࠋ⾲㠃ศᯒ
࡛ࡣࠊᅛయ⾲㠃ࡢ᭱⾲㠃ࡢᩘཎᏊᒙࡘ࠸࡚ࡢᏛ⤌ᡂศᯒࡀྍ⬟࡞ࡿࠋX⥺ග㟁Ꮚศගศᯒ(XPS) ࡣࠊESCA ࡶゝࢃࢀࠊ⾲㠃ศᯒࡢ୰࡛ࡶ᭱ࡶࡦࢁࡃ⏝ࡉࢀ࡚࠸ࡿศᯒἲࡢ୍ࡘ࡛࠶ࡿࠋ㉸㧗┿
✵୰࡛Al-KD⥺࠶ࡿ࠸ࡣMg-KD⥺࠸ࡗࡓ㌾X⥺ࢆヨᩱ⾲㠃↷ᑕࡋࡓヨᩱ⾲㠃ࡽ࡛ࡿග㟁 Ꮚࡢ⤖ྜ࢚ࢿࣝࢠ࣮ࢆ࢚ࢿࣝࢠ࣮࣭ࢼࣛࢨ࣮࡛ ᐃࡍࡿࠋග㟁Ꮚࣆ࣮ࢡࡢ⤖ྜ࢚ࢿࣝࢠ࣮ᙉᗘ
ࡽࠊඖ⣲ࡢྠᐃࠊᐃ㔞ศᯒࡢࠊ⤖ྜ࢚ࢿࣝࢠ࣮ࡢᚤጁ࡞ࢩࣇࢺࡽᏛ≧ែศᯒࡀ࡛ࡁࡿࡇࡀ
≉ᚩ࡛࠶ࡿ(Electron Spectroscopy for Chemical Analysis, ESCA)ࠋXPSࡢᛂ⏝⠊ᅖࡣࠊ㧗ศᏊࠊゐ
፹ࠊ༙ᑟయࠊ㟁Ꮚᮦᩱ࠸ࡗࡓᵝࠎ࡞ᕤᴗ〇ရ࡞ከᒱࢃࡓࡾࠊ᪥ᚲせྍḞ࡞⨨࡞ࡗ࡚࠸
ࡿࠋ⾲㠃ศᯒἲ࡛ศᯒ࡛ࡁࡿ῝ࡉࡣ0.5㹼5 nm࡛࠶ࡿࡇࡽࠊ㉮ᰝ㟁Ꮚ㢧ᚤ㙾ྲྀࡾࡅࡽ
ࢀࡓ࢚ࢿࣝࢠ࣮ศᩓᆺ X ⥺ศᯒ⨨(SEM-EDX)ࡸࣇ࣮࢚ࣜኚ㉥እศගศᯒ⨨(FT-IR)ẚ࡚
ヨᩱࡢᴟ⾲㠃ࡔࡅࡢᏛ⤌ᡂࢆศᯒࡍࡿࡢ㐺ࡋ࡚࠸ࡿࠋᴟ⾲㠃ࡢሗࡋᚓࡿࡇࡀ࡛ࡁ࡞࠸ࡢ࡛ࠊ Ar࢜ࣥࢆ↷ᑕࡼࡗ࡚⾲㠃ࢆ࢚ࢵࢳࣥࢢࡋ࡚ ᐃࡍࡿࡇࢆ⧞ࡾ㏉ࡍࡇࡼࡗ࡚ࠊ῝ࡉ᪉ྥ࡛
Ꮫ≧ែࡀࡢᵝኚࡍࡿࡢࢆ㏣㊧ࡍࡿࡇࡶ࡛ࡁࡿࠋ
ࣝࣂࢵࢡ࣭ࣇQuantera-SXM-GS (㉮ᰝᆺ; ⥺ග㟁Ꮚศගศᯒ⨨㸦ᶵჾศᯒᐊ㸳㸧 X⥺※: ศගࡉࢀࡓAl-KD⥺ ᐃ࣮ࣔࢻ: XPS(ESCA) (ᚤᑠ㡿ᇦࠊ⥺ศᯒࠊ㠃ศᯒ) X⥺ࡢ↷ᑕᚄࢆ9Pm㹼100 Pm࡛ྍኚࡋࠊ㉮ᰝࡋ࡚ヨᩱ⾲㠃↷ᑕࡍࡿࡇࡀྍ⬟
ᶆ‽ヨᩱྎ 75×75 mm (ヨᩱཌࡉ < 20 mm) ຍ⇕࣭෭༷ ᐃ
!"#$%&'()*&+,+-./01 23456
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㸰㸬Surface Analysis Instrument (XPS)
The Center has two surface analysis instruments, Ulvac-Phi Quantera-SXM-GS and Shimadzu ESCA-3400.
The objective of a surface analysis is to determine the chemical composition of the outer few atomic layers of a solid surface. X-ray Photoelectron Spectroscopy (XPS), also known as Electron Spectroscopy for Chemical Analysis (ESCA), is one of the most widely used surface analysis techniques. The sample is irradiated with mono-energetic soft X-rays (Al-KD or Mg-KD) causing photoelectrons to be emitted from the sample surface in ultra high vacuum environment. An electron energy analyzer determines the binding energy of the photoelectrons. From the binding energy and intensity of a photoelectron peak, the elemental identity, chemical state, and quantity of an element are determined. The information XPS provides about surface layers or thin film structures is of value in many industrial applications as follows, polymer surface modification, catalysis, corrosion, adhesion, semiconductor and dielectric materials, electronics packaging, magnetic media, thin film coatings used in a number of industries and so on.
The average analysis depth of these surface analysis techniques is approximately 0.5-5 nm, with the exact analysis depth dependent on the specific technique. As a result, surface analysis techniques provide unique information that cannot be obtained with instruments having a larger analysis depth, such as energy dispersive X-ray analysis (SEM-EDX) and fourier transform infrared analysis (FT-IR). To probe below the surface, surface analysis instruments are equipped with a sputter Ar ion gun to allow the controlled removal of material from the sample surface. This allows the thickness of surface layers to be measured and multi-layer thin film structures to be characterized.
Ulvac-Phi Quantera-SXM-GS (Scanning X-ray microprobe) 㸦Room 5㸧 X-ray sources: monochromatic Al-KD
The diameter of the x-ray beam can be adjusted from less than 9μm to 100μm in diameter.
Measurement mode: XPS (spectroscopy, depth profiling, mapping, line analysis, etc.) Standard platen: 75×75 mm (up to 20 mm thick)
Hot/Cold sample stage
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㸱㸬㧗ศゎ⬟㉁㔞ศᯒ⨨06
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ࡸࣇࣛࢢ࣓ࣥࢺ࢜ࣥࢆ ᐃࡍࡿࠋ
ᙜศ㔝タ⨨ࡉࢀ࡚࠸ࡿ⨨࡛ࡣࠊศᯒᚲせ࡞ヨᩱࡢ㔞ࡣᩘࢼࣀࢢ࣒࡛ࣛ࠶ࡿࠋヨᩱࡣࠊ┤᥋ࠊ 㛫᥋ࠊ࢞ࢫࢡ࣐ࣟࢺࢢࣛࣇ࣮*&➼࡛ᑟධࡉࢀࠊࠊ㟁Ꮚ⾪ᧁ(,ἲࠊᏛ࢜ࣥ&,ἲࠊ㧗
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3. Mass Spectrometer System (MS) (Room 1)
Mass spectrometry is essential to identify organic compounds. After ionization of sample materials, the molecular and fragment ions are measured.
The mass instruments in this center require only a few nanogram order of samples. The samples are introduced into the chamber directly, indirectly, and by way of gas chromatography (GC). Then, the samples are ionized by electron impact (EI), chemical ionization (CI), and fast atom bombardment (FAB) methods.
There are three instruments in this center. Users can select the instruments depending on the kinds of sample materials and the purpose of measurements.
1) JMS-MStation 700 (JEOL) (Double focus type) (Room 1) Specifications:
Mass range: 1-24,000 Da (accelerating voltage: 1 kV) Resolution: 60,000
Introduction: direct and indirect inlet, GC (LC) Ionization: EI, CI, FAB
Measurement mode: low and high resolution, positive and negative ion mode Others: Linked scan
㸧-MS-AMSUN200/GI (K9) (JEOL) (Quadropolar type) (Room 1) Specifications:
Mass range: 1-1,000 Da Resolution: > 2,000 Introduction: GC Ionization: EI, CI
Measurement mode: low resolution
3) GC Mate II GCMS System (JEOL) (Room 1) Specifications:
Mass range: 1-1,000 Da (accelerating voltage: 2.5 kV), 1-2,000 Da (accelerating voltage: 1.25 kV) Resolution: 500, 1000, 3000, 5000 (controlled by computer)
Introduction: direct inlet, GC Ionization: EI, CI, FAB
Measurement mode: low resolution, positive and negative ion mode
㸲
㸲㸬ᾮయࢡ࣐ࣟࢺࢢࣛࣇ㸦+3/&㸧
ࡇࡢHPLCࡣࠊ᳨ฟჾࡋ࡚ࠊ⣸እྍどගศ ග᳨ฟჾ㸦190㹼600 nm㸧ࠊ⺯ග᳨ฟჾ㸦280㹼
900 nm㸧ࠊ♧ᕪᒅᢡ⋡᳨ฟჾ㸦ᒅᢡ⋡ 1.00㹼
1.75㸹ᐊ 㸩5㹼55|C ௨ୖࡢ⠊ᅖ୍࡛ᐃタᐃ
ྍ⬟㸧ࢆഛ࠼࡚࠸ࡲࡍࠋࡇࢀࡽࡢ᳨ฟჾࢆ࠸
ࡇ࡞ࡍࡇࡼࡗ࡚ࠊࢇࡢ᭷ᶵ≀ࡢ㧗ឤ ᗘ᳨ฟࡀྍ⬟࡞ࡾࡲࡍࠋࡲࡓࠊHPLC㉁㔞 ศᯒィࢆ᥋⥆ࡍࡿࡇࡼࡾࠊὶฟ≀ࡢ㐃⥆
㉁㔞ศᯒࡀྍ⬟࡛ࡍ㸦LC-MS㸧ࠋ
HPLCᮏయࡣࠊḟࡢࡼ࠺࡞㒊ศࡽᡂࡾ❧ࡗ
࡚࠸ࡲࡍࠋ
z ࢥࣥࢺ࣮ࣟࣝࣔࢪ࣮ࣗࣝࠊไᚚPCཬࡧࢯࣇࢺ
z ࣑ࢡࣟࢹ࢞ࢵࢧ㸦⁐፹୰ࡢ࢞ࢫࢆྲྀࡾ㝖ࡁἻࡀฟ࡞࠸ࡼ࠺ࡍࡿ㸧
z ࣂࢼ࣮࣏ࣜࣥࣉ㸦㧗ᅽ2ᾮΰྜࡼࡗ࡚ࢢࣛࢪ࢚ࣥࢺࢆసࡾ0.001㹼5 ml/minࡢὶ㔞ࢆㄪ⠇
࡛ࡁࡿ㸧
z ࣒࢝ࣛᜏ ᵴ㸦࣒࢝ࣛ ᗘࢆᐊ ࠊ㸫10㹼80|C௨ୖࡢ⠊ᅖ୍࡛ᐃಖࡘ㸧 z ࣇࣛࢡࢩࣙࣥࢥࣞࢡࢱ࣮㸦ࢧࣥࣉࣝࢆศྲྀࡍࡿ㸧
HPLC࡛≀㉁ࡢศ㞳ࢆᡂຌࡉࡏࡿࡣࠊ࣒࢝ࣛࡢ㑅ᢥࡀ㔜せ࡛ࡍࠋ
⌧ᅾࡢHPLC ࠾࠸࡚ࡣࡑࡢ࣒࡛࢝ࣛࡢศ㞳࣮ࣔࢻࡋ࡚ࡣḟࡢ✀㢮ࡀ㐺⏝ࡉࢀࠊศᯒ⏝
ศྲྀ⏝ࡀ࠶ࡾࡲࡍࠋ
㸦㸧㡰┦ࢡ࣐ࣟࢺࢢࣛࣇ࣮
㸦㸧㏫┦ࢡ࣐ࣟࢺࢢࣛࣇ࣮
㸦㸧ࢧࢬ㝖ࢡ࣐ࣟࢺࢢࣛࣇ࣮
㸦㸧࢜ࣥࢡ࣐ࣟࢺࢢࣛࣇ࣮
ࡇࡢ୰࡛ࠊ≉㢖⦾ࢃࢀࡿࡢࡣ㏫┦ࢡ࣐ࣟࢺࢢࣛࣇ࣮࡛ࡍࠋ
⏝ࡍࡿ࣒࢝ࣛࡣྛ⮬⏝ពࡋ࡚ࡃࡔࡉ࠸ࠋࡲࡓᗫᾮࡣྛ⮬ᣢࡕᖐࡿࡼ࠺ࡋ࡚ࠊᐇ㦂⤊ᚋࡣὶ㊰
࡞ࢆ࣓ࢱࣀ࣮࡛ࣝὙίࡋ࡚࠾࠸࡚ࡃࡔࡉ࠸ࠋ
4. HPLC system (Agilent-1100 series) 㸦Room 1㸧
This system with LC-MS (JMS700) interface may be used for mass analysis of eluates under continuous detection mode.
This HPLC system can detect various organic molecules in high sensitivity under three detection modes;
UV-VIS spectroscopic mode (190~600 nm), fluorescence mode (280~900 nm), and differential refractive index mode (RI 1.00~1.75 at room temperature +5 to 55|C).
Specifications:
z Control module: PC (Windows OS) and control/analysis software
z Degas: micro degasser (to remove gasses in solvents used, resulting in suppression of bubbles) z Pump: Binary pumps for two solvents making gradients with various flow rates (0.001~5 ml/min) z Column temperature: Column chamber with constant temperatures (at room temperature, -10 to 80|C) z Collection of eluates: fraction collector
Notes.
It is important to select suitable columns to succeed in good separation of materials. Packed columns are used mainly for chromatography, such as normal phase, reversed phase, size-exclusion, and ion chromatography. Among them the revsersed phase chromatography is most frequently used in the field of biological and analytical chemistry.
For person who want to use this HPLC system he or she must prepare his or her own column, and should take out waste solvents and wash the flow pipes by methanol after completion of the experiment.
㸳
㸳㸬ࣇ࣮࢚ࣜኚ᰾☢Ẽඹ㬆⨨㸦)7105㸧
⌧ᅾࠊ᰾☢Ẽඹ㬆105ࡣศᏊࡢᵓ㐀ࡸ≀ᛶࢆ▱ࡿ᭱ࡶ㔜せ࡞ศᯒἲࡢ୍ࡘ࡛ࠊ᭷ᶵᏛ㸪≀⌮
Ꮫࡢࡳ࡞ࡽࡎ㎰Ꮫࠊ་Ꮫ࡞ࡢ⏕⛉Ꮫࡢ◊✲ࡶᗈࡃࢃࢀ࡚࠸ࡿࠋࡉࡽࠊኳ↛≀Ꮫࡢᐤࠊ
་⒪ศ㔝࡛ࡢ 105 ࣓࣮ࢪࣥࢢ㸦057 ᩿ᒙᫎീ㸧࡞࡛ࡶヰ㢟࡞ࡗ࡚࠸ࡿࠋ
≀㉁ࢆ☢ሙࡢ୰⨨࠸ࡓࡁࠊ+ࠊ& ࠸ࡗࡓཎᏊࡢཎᏊ᰾ࡢ≧ែࡣ࠸ࡃࡘࡢ࢚ࢿࣝࢠ࣮‽
ศࡋࠊࡇࢀඹ㬆࿘Ἴᩘࡢࣛࢪ࢜Ἴࢆ↷ᑕࡍࡿࡇ࡛ࡑࡢ‽㛫ࡢ㑄⛣ࡀ㉳ࡇࡿࠋࡑࡢ㑄⛣࢚ࢿ
ࣝࢠ࣮㸦ࡍ࡞ࢃࡕࣛࢪ࢜Ἴࡢඹ㬆࿘Ἴᩘ㸧ࡣཎᏊ᰾ࡢ㟁Ꮚ≧ែࡼࡾᚤጁ␗࡞ࡗ࡚࠾ࡾ㸦ࡇࢀࢆ
Ꮫࢩࣇࢺ࠸࠺㸧ࠋࡇࡢࡇࡽྛࠎࡢཎᏊࡢ≧ែࠊ࠶ࡿ࠸ࡣࡑࡢཎᏊࢆྵࡴཎᏊᅋ㸦⨨ᇶ㸧ࡢ
Ꮫⓗᛶ㉁ࢆ▱ࡿࡇࡀ࡛ࡁࡿࠋ
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㸱㸧᪥ᮏ㟁Ꮚ (&$㸦0+]㸧㸦ᶵჾศᯒᐊ㸱㸧
㏻ᖖ ᐃ㸦+㸪&㸪'(37㸪&26<㸪+0%&㸪+04&㸪 ᕪ 12( ࡞㸧ࡢࡳ࡞ࡽࡎࠊࣃࣝࢫ☢ሙ໙㓄ἲ 㸦3)*㸧ࢆ⏝࠸ࡿࡇࡼࡾࠊຠ⋡ⓗ࡞ ḟ ඖࡢ ᐃࠊྛ✀ከ᰾ࡢ ᐃࠊ ᗘྍኚ ᐃࡶ
㠀ᖖ⡆౽ ᐃ࡛ࡁࡿࠋࡲࡓࠊᅛయ 105 ᐃࣘࢽࢵࢺࡀഛࡉࢀࠊᅛయᏛࠊ⏕య㧗 ศᏊศ㔝ࡶᛂ⏝ྍ⬟࡛࠶ࡿࠋ
ᅛయ 105 ᐃࣘࢽࢵࢺ㸦10&30㸧
ࣉ࣮ࣟࣈ㸸PP ᚄ &30$6 ࣉ࣮ࣟࣈ
ほ ᰾㸦ࣉ࣮ࣟࣈ㸧㸸+16L㹼3
5. Fourier Transform Nuclear Magnetic Resonance Spectroscopy (FT-NMR)
Nuclear Magnetic Resonance (NMR) spectroscopy has become one of the most important tools for investigating the molecula
