Subject j
1.
반도체의 전계가 가해졌을 때 전자는 어떻게 움직이고 전 자의 이동도와 저항과는 어떤 관계에 있는가자의 이동도와 저항과는 어떤 관계에 있는가?
캐리어의 확산은 전 에 어떻게 기여하 가
2. excess 캐리어의 확산은 전류에 어떻게 기여하는가?
3.
캐리어의 주입은 어떻게 할 수 있는가? 또, 주입된 캐리어 들은 어떻게 되는가?1
직접형 및 간접형 반도체1.
직접형 및 간접형 반도체2.
재결합 수명3. quasi-Fermi level 3. quasi Fermi level
4.
확산과 재결합을 동시에 고려했을 때의 전류는? Drift
Diffusion
Generation Recombination
Generation-Recombination
Equations of State
Drift
Drift
• Definition-Visualization
9 Ch d i l i i l i fi ld
9 Charged-particle motion in response to electric field
9 An electric field tends to accelerate the +q charged holes in the direction of the electric field and the –qq charged electrons in the g opposite direction
9Collisions with impurity atoms and thermally agitated lattice atoms 9 Repeated periods of acceleration and subsequent decelerating 9 Repeated periods of acceleration and subsequent decelerating collisions
9 Measurable quantities are macroscopic observables that reflect the average or overall motion of the carriers
9The drifting motion is actually superimposed upon the always- present thermal motion
present thermal motion.
9 The thermal motion of the carriers is completely random and therefore averages out to zero, does not contribute to current
(a) Motion of carriers within a biased semiconductor bar; (b) drifting hole on a microscopic or atomic scale; (c) carrier drift on a macroscopic scale
• Drift Current
Thermal motion of carrier
• Drift Current
9 I (current) = the charge per unit time crossing a plane oriented normal to the direction of flow
Expanded view of a biased p-type semiconductor bar of cross-sectional
A area A
... All holes this distance back from the normal plane will
d d
v t v −
cross the plane in a time
... All holes in this volume will cross the plane in a time
d
t
v tA t
pv tA ... Holes crossing the plane in a time d
... Charge crossing the plane in a time Charge crossing the plane per nit time
d
t
qpv tA t
A
... Charge crossing the plane per unit time
tqpv A t
J
P drift|= qpv
dJ
The vd is proportional to E at low electric fields, while at high electric fields v saturates and becomes independent of E
fields v saturates and becomes independent of E
where for holes and for electrons, is the constant of
proportionality between vd and E at low to moderate electric fields, and is the limiting or saturation velocity
vsat
≅
1
β β
≅2 μ
0is the limiting or saturation velocity 9 In the low field limit
v
d= μ
0E,
d n,
N drift| dq v μ E qnv
− = − J = −
to drift to drift
9 Unit: cm2/Vs
9 Varies inversely with the amount of scattering (i) Lattice scattering
(ii) Ionized impurity scattering
9Displacement of atoms leads to lattice scattering 9Displacement of atoms leads to lattice scattering
The internal field associated with the stationary array of atoms is already taken into account in m*
9 , where is the mean free time and is the conductivity effective mass
9 The number of collisions decreases Æ μ varies inversely with
/
*q m
μ = < > τ < > τ m
*τ
< >
The number of collisions decreases Æ μ varies inversely with the amount of scattering
τ
< >
Room temperature carrier mobilities as a function of the dopant
Impedance to motion due to
lattice scattering : Impedance to motion due to ionized impurity scattering : g
-No doping dependence.
-Decreases with decreasing T.
ionized impurity scattering : -Increases with NA or ND -Increases with decreasing T.
9 Temperature dependence
9 Low doping limit: Decreasing temperature causes an ever- c eases t dec eas g .
9 Low doping limit: Decreasing temperature causes an ever- decreasing thermal agitation of the atoms, which decreases the lattice scattering
9 Higher doping: Ionized impurities become more effective in deflecting the charged carriers as the temperature and hence the speed of the carriers decreasesp
Temperature dependence of electron mobility in Si for dopings ranging from < 1014 cm-3 to 1018 cm-3
from < 1014 cm 3 to 1018 cm 3.
Temperature dependence of hole mobility in Si for dopings ranging from
< 1014 cm-3 to 1018 cm-3
< 1014 cm 3 to 1018 cm 3.
• Resistivity Resistivity
9 Resistivity (ρ) is defined as the proportionality constant between the electric field and the total current per unit area
Resistivity versus Resistivity versus impurity
concentration at 300 K in Si
• Band Bending
9When exists the band energies become a function of
ε
energies become a function of position
9 If an energy of precisely EG is added to break an atom-atom bond, the created electron and hole
motionless
the created electron and hole energies would be Ec and Ev,
respectively, and the created carriers ld b ff ti l ti l
would be effectively motionless
9 E-Ec= K.E. of the electrons 9 Ev-E= K.E. of the holes
P E
= E − E f9The potential energy of a –q charged
c ref
P.E.
E Ec ref
P.E.
= E − Eparticle is
P.E. = − qV
9 By definition,
9 In one dimension,
9 Diffusion is a process wherebyDiffusion is a process whereby
particles tend to spread out or redistribute as a result of their random thermal motion,
i ti i l f
migrating on a macroscopic scale from regions of high concentration into region of low concentration
• Diffusion and Total Currents
9 Diffusion Currents: The greater the concentration gradient, the larger the flux
9 Using Fick’s law,
N diff|
= − qD
N∇ n
J [ D ] = cm
2/ s
N diff|
qD
N∇ n J
9 Total currents
9 Total particle currents
+ J = J
N+ J
PJ J J
• Relating Diffusion coefficients/Mobilities
9 Einstein relationship9Consider a nonuniformly doped semiconductor under equilibrium 9Consider a nonuniformly doped semiconductor under equilibrium 9 Constancy of the Fermi Level: nonuniformly doped n-type
semiconductor as an example
dE
F/ dx
= 0= dE
F/ dy = dE
F/ dz = 0
Electron diffusion current flowing in the +x direction “Built-in”
electric field in the –x direction Æ drift current in the –x direction
9 Einstein relationship:
9 Nondegenerate nonuniformly doped semiconductor Under 9 Nondegenerate, nonuniformly doped semiconductor,Under equilibrium conditions, and focusing on the electrons,E
9 With dE /d 0 9 With dEF/dx=0,
9 Substituting
k q D kT
n N
= μ
q kT D
p P
= μ
9 Einstein relationship is valid even under nonequilibrium 9 Slightly modified forms result for degenerate materials
p
Slightly modified forms result for degenerate materials
9 When a semiconductor is perturbed Æp an excess or deficit in the carrier concentrations Æ Recombination-generation
9 Recombination: a process whereby electrons and holes (carriers) are annihilated or destroyed
are annihilated or destroyed
9 Generation: a process whereby electrons and holes are created
Band to Band Recombination
• Band-to-Band Recombination
9 The direct annihilation of an electron and a hole Æ the production of a photon (light)
• R-G Center Recombination
9 R-G centers are lattice defects or impurity atoms (Au)
9 The most important property of the R-G centers is the introduction 9 The most important property of the R G centers is the introduction of allowed electronic levels near the center of the band gap (ET)
9Two-step process
9 G ( )
9 R-G center recombination (or indirect recombination) typically releases thermal energy (heat) or, equivalently, produces lattice vibration
Near-midgap energy levels introduced by some common impurities in Si
• Generation Processes
9thermal energy > EG Æ direct thermal generation 9light with an energy > EG Æ photogeneration
9light with an energy > EG Æ photogeneration
9 The thermally assisted generation of carriers with R G centers 9 The thermally assisted generation of carriers with R-G centers
energetic carrier collide with the lattice energetic carrier collide with the lattice 9High -field regions
ε
• Momentum Considerations
9One need be concerned only with the dorminat process
9Crystal momentum in addition to energy must be conserved.
9The momentum of an electron in an energy band can assume only certain quantized values. q
9where k is a parameter proportional to the electron momentum
Si, Ge GaAs
Photons: light Photons: light
Phonons: lattice vibration quanta
Photons, being massless entities, carry very little momentum and a
The thermal energy associated with lattice vibrations (phonons) is very small (in the 10 carry very little momentum, and a
photon-assisted transition is
essentially vertical on the E-k plot
vibrations (phonons) is very small (in the 10- 50 meV range), whereas the phonon
momentum is comparatively large. A phonon- assisted transition is essentially horizontal on assisted transition is essentially horizontal on the E-k plot. The emission of a photon must be accompanied by the emission or
absorption of a phonon absorption of a phonon.
∂t) that must be specified
∂t) that must be specified
9 B-to-B recombination is totally negligible compared to R-G center recombination in Si
9 G f
9Even in direct materials, the R-G center mechanism is often the dominant process.
• Indirect Thermal Recombination-Generation
n0
, p
0…. carrier concentrations when equilibrium conditions prevail
n, p ……. carrier concentrations under arbitrary conditions
, p y Δ
n=n-n0… deviations in the carrier concentrations from their equilibrium values
equilibrium values Δ
p=p-p0…
N
number of R G centers/cm
3 NT………. number of R-G centers/cm
39Although the majority carrier concentration remains essentially unperturbed under low-level injection, the minority carrier
concentration can increase by many orders of magnitude.
9 The greater the number of filled R-G centers, the greater the probability of a hole annihilating transition and the faster the rate of probability of a hole annihilating transition and the faster the rate of recombination
9Under equilibrium, essentially all of the R-G centers are filled with electrons because EF>>ET
9With , electrons always vastly outnumber holes and
rapidly fill R-G levels that become vacant Æ # of filled centers during rapidly fill R G levels that become vacant Æ # of filled centers during the relaxation N
≅
TN
Tt
p ∝
∂
∂
9 The number of hole-annihilating transitions should increase almost linearly with the number of holes
t
R∂
p c N p
∂ =
y
9 Introducing a proportionality constant, cp,
c N p
= −
9The recombination and generation rates must precisely balance under equilibrium conditions, or ∂p/∂t|G = ∂p/∂t|G-equilibrium=- ∂p/∂t|R-equilibrium
p T 0
p c N p
∂ =
p T 0G
c N p
∂ t
9 The net rate
p T 0
i thermal
R G
R G
( )
p p p
c N p p
t
−t t
−
∂ ∂ ∂
= + = − −
∂ ∂ ∂
p T i thermal
R G
or p for holes in an type material
c N p n
t
−−
∂ = − Δ −
∂
R Gfor electrons in a type material
n c N n p
∂ = − Δ −
9 An analogous set of arguments yields
n T
for electrons in a type material
c N Δ n p
∂
n p
9c N and c N must have units of 1/time 9cpNT and cnNT must have units of 1/time
p n
1 1
N N
τ
p= , τ
n=
p T n T
c N c N
for holes in an type material
p p
t n
∂ Δ
= − −
∂
i thermal pt
−R Gτ
−
∂
i th l
for electrons in a type material
n n
t τ p
∂ = − Δ −
∂
i thermal nt
−R Gτ
−
∂
9 The average excess hole lifetime <t> can be computed 9 The average excess hole lifetime <t> can be computed
: 9
)
(
pn
or
t >= τ τ
<
9
τ
n( or τ
p)
: minority carrier lifetimes Equations of State
Equations of State
• Continuity Equations
9 C i i h h i b d if diff i i di di
9 Carrier action – whether it be drift, diffusion, indirect or direct thermal recombination, indirect or direct generation, or some other type of carrier action – gives rise to a change in the carrier yp g g
concentrations with time
9Let’s combine all the mechanisms
thermal other processes
drift diff
R G (li h )
n n n n n
t t t t t
∂ ∂ ∂ ∂ ∂
= + + +
∂ ∂
drift∂
diff∂ ∂
R -G (light, etc.)
p p p p p
∂ ∂ ∂ ∂ ∂
= + + +
∂ ∂
drift∂
diff∂
thermal∂
other processesR -G (light, etc.)
t t t t t
∂ ∂ ∂ ∂ ∂
Ny Nz
Nx
J J J
n J
n ∂ + ∂ = ∇
∂ +
∂ =
∂ + 1
) 1 (
Py Pz Px
N diff
drift
J J J J
p p
q J z
y x
q t
t
∂ ∇
∂ +
∂ + + ∂
∂
⋅
∇
∂ =
∂ +
∂ +
∂ =
∂ +
) 1 1 (
) (
P y Pz
Px diff
drift
q J z
y x
q t
p t
p = − ∇ ⋅
+ ∂ + ∂
− ∂
∂ =
∂ + ( )
processes other G
R thermal
N
t
n t
J n q
t n
∂ + ∂
∂ + ∂
⋅
∇
∂ =
∂ 1
other thermal
P
processes G
R
t p t
J p q
t p
q
∂ + ∂
∂ + ∂
⋅
∇
−
∂ =
∂
−
1
processes G
R
t
t q
t ∂ ∂
∂
−Mi it C i Diff i E ti
• Minority Carrier Diffusion Equations
9 Simplifying assumptions:(1) One dimensional (1) One-dimensional
(2) The analysis is limited or restricted to minority carriers
(3) .
(4) The equilibrium minority carrier concentrations are not a (4) The equilibrium minority carrier concentrations are not a
function of position (5) Low level injection
(6) Indirect thermal R-G is the dominant thermal R-G mechanism
0 0
( ),
0 0( )
n ≠ n x p ≠ p x
(6) Indirect thermal R G is the dominant thermal R G mechanism (7) There are no “other processes”, except possibly
photogeneration
N N
1 1 J
q q x
∇ ⋅ → ∂
J ∂
n
0n ∂ n n
∂ = + ∂Δ = ∂Δ
x x x x
∂ ∂ ∂ ∂
1
2n
D ∂ Δ
∇ J
N→ D
N 2q ∇ ⋅ → x
J ∂
9 With low level injection 9 With low level injection,
n n
∂ Δ
∂
thermal= −
nt
R -Gτ
∂
other L processes
n G
t
∂ =
∂
Æ GL=0 without illuminationprocesses
9 Th ilib i l t t ti i f ti f ti 9 The equilibrium electron concentration is never a function of time
n
0n n n
t t t t
∂
∂ ∂Δ ∂Δ
= + =
∂ t ∂ t ∂ t ∂ t
∂ ∂ ∂ ∂
n
2n n
∂Δ
p∂ Δ
pΔ
pN 2 L
n 2
n n n
D G
t x
p p p
τ
∂Δ ∂ Δ Δ
= − +
∂ ∂
∂Δ ∂ Δ Δ
Minority carrier diffusion equations
n n n
P 2 L
p
p p p
D G
t x τ
∂Δ = ∂ Δ − Δ +
∂ ∂
q
9 Steady state
• Simplifications and Solutions
y0 0
p n
n p
t t
∂Δ ∂ ∂ t → ⎛ ⎜ ⎝ ⎝ ∂Δ ∂ ∂ t → ⎞ ⎟ ⎠ ⎠
0 0
p n
n p
D
N∂ Δ
2→ 0 ⎛ ⎜ D
P∂ Δ
2→ 0 ⎞ ⎟
D D
x → ⎜ x → ⎟
∂ ⎝ ∂ ⎠
9 No drift current or Æ
E = 0
no further simplificationp 9 No thermal R-Gn ⎛ p ⎞
Δ Δ
0 0
p n
n p
n p
τ τ
⎛ ⎞
Δ Δ
→ ⎜ ⎜ ⎝ → ⎟ ⎟ ⎠
9 No light
0
G
L→ 0
G →
9 S l bl 2 A h b l th 0 d f if l 9 Sample problem 2: As shown below, the x=0 end of a uniformly doped semi-infinite bar of silicon with ND=1015 cm-3 is illuminated so as to create Δppn0n0=1010 cm-3 excess holes at x=0. The wavelength of g the illumination is such that no light penetrates into the interior (x>0) of the bar. Determine Δpn(x).
9Diffusion and recombination
9 As the diffusing holes move into the bar their numbers are reduced by recombination
9 Under steady state conditions it is reasonable to expect an excess 9 Under steady state conditions it is reasonable to expect an excess distribution of holes near x=0, with Δpn(x) monotonically decreasing from Δpn0 at x=0 to Δpn0= 0 as x Æ ∞
9 E 0 ? Yes
1>Excess hole pile-up is very small
2>The majority carriers redistribute in such a way to partly cancel
≅
) ( Δ p
n max≅ n
ij y y p y
the minority carrier charge.
9 Under steady state conditions with GL=0 for x > 0
2
n n
p 2
p
0 for 0
d p p
D x
dx τ
Δ Δ
− = >
0
Δ p =
n x 0 n x 0 n 0
p
⏐ = +p
⏐ =p
Δ = Δ = Δ
p
Δ p = 0
9 Th l l ti 9 The general solution
P P
/ /
n
( )
x L x Lp x Ae
−Be
Δ = +
whereL
p≡ D
pτ
pexp(x/Lp) Æ ∞ as x Æ ∞
⇒ = B 0
9 With 0 9 With x=0,
A = Δ p
n 0/ P
n
( )
n0 x Lsolution p x p e
−Δ = Δ ⇐
Supplemental Concepts
Supplemental Concepts
• Diffusion Lengths
9 minority carrier diffusion lengths
P P p
L
P≡ D
P pτ
N N n
L ≡ D τ
9LP and LN represent the average distance minority carriers can diffuse into a sea of majority carriers before being annihilated
9 f
9 The average position of the excess minority carriers inside the semiconductor bar is
n n P
0
( )
0( )
x
∞x p x dx
∞p x dx L
〈 〉 = ∫ Δ ∫ Δ =
Q i F i L l
• Quasi-Fermi Levels
9 Quasi-Fermi levels are energy levels used to specify the carrier concentrations under nonequilibrium conditionsq
9 Equilibrium conditions prevailed prior to t=0, with n0=ND=1015 cm-3 and p0=105 cm-3
kT E
E
kT E E i
F i
i
e
Fn n
/ ) (
/ ) (
0
−
=
−9
Δ = p G τ = 10 cm
11 -3p = p + Δ p ≅ 10 cm
11 -3n n ≅ n 10
0 15= 10 cm
15-3cm
−3kT E
E i
F
e
in
p
0=
( )/9
9 The convenience of being able to deduce the carrier concentrations by inspection from the energy band diagram is extended to
ilib i di i h h h f i F i l l b
10 cm ,
010 cm , 10 cm
n L p
p G τ p p p n
Δ = = = + Δ ≅ n ≅ n
010 cm
nonequilibrium conditions through the use of quasi-Fermi levels by introducing FN and FP .
Equilibrium conditions Nonequilibrium conditions Equilibrium conditions Nonequilibrium conditions
⎛ ⎞ n
N i
( ) /
N i
or ln
F E kT i
i
n n e F E kT n
n
−
⎛ ⎞
≡ ≡ + ⎜ ⎟
⎝ ⎠
i P
⎛ ⎞
( ) /
P i
or ln
E F kT i
i
p n e F E kT p
n
−
⎛ ⎞
≡ ≡ + ⎜ ⎟
− ⎝ ⎠