LI – lithography
Materials tailored to the individual function in application - Cu, Au → electrical conductors
- Ni, Fe → softmagnetic materials
- Polymers, ceramic materials → insulators
Flexible geometry (no restriction to specific crystallographic planes) High lateral precision (small shrinkage) ≅ 0.5 µm
Smooth structure at the side walls (roughness < 50 nm, optical quality) Very high aspect ratio 1 : 100
Moulding possible directly on the Si wafer Independent of the substrate
Independent of the substrate
Useful for low-cost mass production
Reduction of fabrication costs by a simultaneous implementation of many elements
Disadvantage:
for fabrication of complex components → micro mounting necessary; no possibility to implement electronic circuits;